2011
DOI: 10.1021/nl201902w
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Three-Dimensional Multiple-Order Twinning of Self-Catalyzed GaAs Nanowires on Si Substrates

Abstract: In this paper we introduce a new paradigm for nanowire growth that explains the unwanted appearance of parasitic nonvertical nanowires. With a crystal structure polarization analysis of the initial stages of GaAs nanowire growth on Si substrates, we demonstrate that secondary seeds form due to a three-dimensional twinning phenomenon. We derive the geometrical rules that underlie the multiple growth directions observed experimentally. These rules help optimizing nanowire array devices such as solar or water spl… Show more

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Cited by 126 publications
(157 citation statements)
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“…Nanowires were grown on oxidized Si(111) with 100 nm apertures using a self-catalysed method. The gallium nominal growth rate was 900 nm h 21 , the substrate temperature was 630 8C and the V/III ratio was 4 (refs 43,44). The p-doping of the core was achieved by adding a flux of beryllium during axial growth 45 .…”
Section: Methodsmentioning
confidence: 99%
“…Nanowires were grown on oxidized Si(111) with 100 nm apertures using a self-catalysed method. The gallium nominal growth rate was 900 nm h 21 , the substrate temperature was 630 8C and the V/III ratio was 4 (refs 43,44). The p-doping of the core was achieved by adding a flux of beryllium during axial growth 45 .…”
Section: Methodsmentioning
confidence: 99%
“…24,[43][44][45] Therefore, investigating the structural defects near the interface between the substrate and the Gd-doped ZnO wetting layer is essential for a better understanding of the growth mechanism. 44 For this purpose, a cross-section along the c-axis of the NRs sample (Fig 1c) was analyzed by HRTEM.…”
Section: Growth Mechanismmentioning
confidence: 99%
“…The GaAs NW cores were obtained by the Ga-assisted method 24 on (111) silicon wafers. 25 After the core reached around 10 lm in length, the Ga flux was interrupted and the As 4 flux increased, resulting in the stopping of the axial growth. The substrate temperature was then decreased from 640 C to 460 C to allow the growth of high quality epitaxial Al x Ga 1Àx As shells.…”
mentioning
confidence: 99%