Three-dimensional micro-/nano-structuring via direct write polymerization with picosecond laser pulses

Malinauskas, Mangirdas; Danilevičius, Paulius; Juodkazis, Saulius

doi:10.1364/oe.19.005602

Cited by 133 publications

(99 citation statements)

References 33 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…The good agreement of the slope of the solid line with the measured data indicates that two-photon absorption induced polymerization is the dominant process in structure formation. However, a possible contribution of thermal effects on the polymerization process caused by the high repetition rate of the laser system 31 has to be investigated in further experiments.…”

Section: Journal Of Laser Applicationsmentioning

confidence: 99%

Materials and technologies for fabrication of three-dimensional microstructures with sub-100 nm feature sizes by two-photon polymerization

Burmeister

Steenhusen

Houbertz

et al. 2012

Journal of Laser Applications

View full text Add to dashboard Cite

The fabrication of sub-100 nm feature sizes in large-scale three-dimensional (3D) geometries by two-photon polymerization requires a precise control of the polymeric reactions as well as of the intensity distribution of the ultrashort laser pulses. The authors, therefore, investigate the complex interplay of photoresist, processing parameters, and focusing optics. New types of inorganic– organic hybrid polymers are synthesized and characterized with respect to achievable structure sizes and their degree of crosslinking. For maintaining diffraction-limited focal conditions within the 3D processing region, a special hybrid optics is developed, where spatial and chromatic aberrations are compensated by a diffractive optical element. Feature sizes below 100 nm are demonstrated.

show abstract

Section: Journal Of Laser Applicationsmentioning

confidence: 99%

Materials and technologies for fabrication of three-dimensional microstructures with sub-100 nm feature sizes by two-photon polymerization

Burmeister

Steenhusen

Houbertz

et al. 2012

Journal of Laser Applications

View full text Add to dashboard Cite

show abstract

“…E values were set in the range of 0.01 μJ to 0.3 μJ. We calculated the peak intensity (irradiance) values as in [29], with an approximate beam waist radius ~300 nm.…”

Section: Methodsmentioning

confidence: 99%

Femtosecond direct laser writing of photonic spatial filters in soda–lime glass

Gailevičius¹,

Purlys²,

Maigytė³

et al. 2015

Lith. J. Phys.

View full text Add to dashboard Cite

An experimental study of the efficiency of recently predicted photonic crystal (PhC) based spatial filtering is provided. Photonic structures are fabricated using a direct laser writing technique employing point-by-point modification by tightly focused femtosecond pulses in soda-lime glass. Such PhCs are characterized by using an s-coefficient -a parameter defining PhC filter efficiency. We explore the dependences of filtering efficiency on different laser writing conditions, such as irradiation peak intensity and the polarization of laser beam. In addition, we show that the PhCs can also exhibit even asymmetric shapes of voxels under particular conditions.

show abstract

“…Usually the photosensitive materials reported by researchers who have used sub-nanosecond lasers are proprietary in nature 12 . We used commercially available negative photoresists SU-8-3005 (MicroChem Corp., USA) and AR-N 4340 (Allresist, Germany).…”

Section: Photosensitive Materialsmentioning

confidence: 99%

“…Other groups have utilized hybrid organic-inorganic resist such as SZ2080 (ORMOSIL) for the fabrication of high-resolution structures with picosecond lasers. Also, 2,4-diethyl-9H-thioxanten-9-one was shown to effectively work as a photoinitiator with SZ2080 photoresist using 8 ps laser pulses 12 . These results clearly paved the way for low-cost fabrication systems and moving towards industrial rapid production 13 .…”

mentioning

confidence: 99%

Microstructuring by Two-Photon Polymerization using a Sub-Nanosecond Laser

Kumar¹,

Ramakrishna²

2017

Current Science

View full text Add to dashboard Cite

A multi-photon absorption-based laser writing system with sub-micrometer resolution has been developed using an inexpensive sub-nanosecond laser for two-and three-dimensional structuring in photosensitive resist materials. New combinations of commercially available photoresists such as SU-8 and AR-N 4340, and a photoinitiator (2, 4, diethyl-9H-thioxanten-9-one) with large two-photon absorption at 532 nm are shown to be effective in obtaining sub-micrometer line or dot resolution. Systematic studies of the resolution on the system and fabrication parameters such as laser power, writing speed, focusing arrangement, etc. have been carried out. The sub-nanosecond-based laser micro writer is an inexpensive alternative with similar capabilities as a femtosecond-based laser writer. This system is comparably effective and has much higher capabilities for 2D structuring in terms of the aspect ratio of the fabricated structures than conventional 2D laser micro writers.Keywords: Fabrication parameters, photoresists, subnanosecond laser, two-photon polymerization, writing system. DURING the past few decades, several nano/micro fabrication techniques such as electron beam lithography (EBL), focused ion beam (FIB) milling and photolithography have been developed for the fabrication of simple as well as complex nano/microstructures 1 . Conventional laser writing and FIB milling have been only partially successful for fabrication of 3D micro/nanostructures. The need for vacuum using EBL and FIB methods can be disadvantageous. Micro-stereo lithography is an alternative method for 3D micro fabrication 2 , but has its limitations in terms of spatial resolution and writing speed. Multiphoton lithography can be highly advantageous over other techniques due to the localized nature of polymerization that can be employed for fabrication of highly complex 3D microstructures with spatial resolution far smaller than 100 nm using tightly focused beams beyond the diffraction limit 3,4 . This technique has found numerous applications in the fields of plasmonics 5 , memory devices 6 , photonic devices 7 , microelectromechanical systems (MEMS) 8 and chemical and biosensors 9 . Much of multi-photon laser writing has been carried out using titanium: sapphire femtosecond lasers operating at 780 nm wavelength. Although the ultrashort pulses are efficient for multi-photon polymerization, they are associated with high equipment cost. This can be offset by picosecond or sub-nanosecond lasers and using photointiators with large two-photon absorption cross-sections to obtain sub-wavelength resolution. He et al. 10 have reported a series of multi-photon absorbing materials that can be used for multi-photon polymerization using picosecond and sub-nanosecond lasers. Chung et al.11 have reported 3D micro-structuring using a low-cost Q-switched Nd : YAG microlaser. Other groups have utilized hybrid organic-inorganic resist such as SZ2080 (ORMOSIL) for the fabrication of high-resolution structures with picosecond lasers. Also, 2,4-diethyl-9H-thioxanten-9-one...

show abstract

Three-dimensional micro-/nano-structuring via direct write polymerization with picosecond laser pulses

Cited by 133 publications

References 33 publications

Materials and technologies for fabrication of three-dimensional microstructures with sub-100 nm feature sizes by two-photon polymerization

Materials and technologies for fabrication of three-dimensional microstructures with sub-100 nm feature sizes by two-photon polymerization

Femtosecond direct laser writing of photonic spatial filters in soda–lime glass

Microstructuring by Two-Photon Polymerization using a Sub-Nanosecond Laser

Contact Info

Product

Resources

About