DOI: 10.31274/rtd-180813-10733
|View full text |Cite
|
Sign up to set email alerts
|

Three Dimensional Integration (3DI) of semiconductor circuit layers: new devices and fabrication process

Abstract: This manuscript has been reproduced jS^om the microfilm master. UMI films the text directly fi-om the original or copy submitted. Thus, some thesis and dissertation copies are in typewriter face, while others may be fi-om any type of computer printer.The quality of this reprodaction is dependent upon the quality of the copy submitted. Broken or indistinct print, colored or poor quality illustrations and photographs, print bleedthrough, substandard margins, and improper alignment can adversely affect reproducti… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 13 publications
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?