Three-dimensional electrochemical microfabrication of n-GaAs using l-cystine as a scavenger

Microfabrication of a Diffractive Microlens Array on n‐GaAs by an Efficient Electrochemical Method

“…Owing to its quick reaction with bromine near the electrode with a very high pseudo-first-order reaction rate constant of 7 × 10 5 s -1 (K s ), L-cystine can be used as a scavenger. [34] Then the Br 2 etchant is closely retained near the mold and does not diffuse into the bulk solution, so the etchant layer keeps the profile of the complex 3D mold. The electrochemical and chemical processes involved in the fabrication process are as follows:…”

New Strategy for Electrochemical Micropatterning of Nafion Film in Sulfuric Acid Solution

“…[36][37][38][39][40] Unfortunately, the micropatterning of functional polymers, such as Nafion film, has not yet been achieved. The controllable cleavage of carbon-carbon chains of polymers remains a major challenge.…”

Electrochemical mechanical micromachining based on confined etchant layer technique

“…CELT has been proved successful in the fabrication of 3D microstructures on metals, 11,12 metal alloys 13 and semiconductors. 10,[14][15][16][17] In general, a molded tool electrode with certain complementary microstructure is used. The mold material can be a Pt-Ir alloy, silicon or PMMA and so on.…”

“…The mold material can be a Pt-Ir alloy, silicon or PMMA and so on. [10][11][12][13][14][15][16][17][18][19][20] A thin layer of titanium and then a layer of platinum are deposited on the surface of silicon or PMMA layer through magnetron sputtering to make the mold conductive and stable enough as an electrode. For the metal and metal alloy workpieces, protons are generated as the etchant while sodium hydroxide is used as the scavenger.…”