2013
DOI: 10.1038/ncomms3061
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Three-dimensional deep sub-diffraction optical beam lithography with 9 nm feature size

Abstract: The current nanofabrication techniques including electron beam lithography provide fabrication resolution in the nanometre range. The major limitation of these techniques is their incapability of arbitrary three-dimensional nanofabrication. This has stimulated the rapid development of far-field three-dimensional optical beam lithography where a laser beam is focused for maskless direct writing. However, the diffraction nature of light is a barrier for achieving nanometre feature and resolution in optical beam … Show more

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Cited by 476 publications
(337 citation statements)
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“…39 Recently, a photopolymerizable material with improved photosensitivity and mechanical stability has been developed and successfully applied in using the SPIN method for the fabrication of suspended lines with the smallest feature size down to 9 nm, or l/42. 20 These exceptional features open a new avenue toward diffraction-unlimited laser fabrication, as well as for the development of ultrahigh-density optical memory.…”
Section: D Super-resolution Recordingmentioning
confidence: 99%
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“…39 Recently, a photopolymerizable material with improved photosensitivity and mechanical stability has been developed and successfully applied in using the SPIN method for the fabrication of suspended lines with the smallest feature size down to 9 nm, or l/42. 20 These exceptional features open a new avenue toward diffraction-unlimited laser fabrication, as well as for the development of ultrahigh-density optical memory.…”
Section: D Super-resolution Recordingmentioning
confidence: 99%
“…Table 1 summarizes the state of the art of SPIN-based super-resolution recording methods for the production of ultrafine features. In general, photoinduction can refer to any photoinduced chemical or physical processes that initiate a change in material properties, such as photochromism, 39 photopolymerization 20 and photoreduction, 48 and that can also be terminated by an inhibition beam operating at a different wavelength. As such, the photochromism process has been used to inhibit photoabsorption, and the smallest line-feature size of 30 nm (approximately one-tenth of the wavelength l) has been successfully demonstrated.…”
Section: D Super-resolution Recordingmentioning
confidence: 99%
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“…Recent developments in the engineering and manipulation of materials on the nanoscale have given rise to a number of new techniques with the potential for physically encoding data and images into optically readable volumes and surfaces. [23,24] Using semiconductor quantum dots, [25][26][27] graphene, [28] and various super-resolution lithography techniques, [29][30][31][32][33][34] researchers are demonstrating novel 2D and 3D techniques that may enable the next generation of optical storage and encoding technologies. Plasmonic particles and filters have also seen applications in these research areas, with the aforementioned image encoding examples having been joined by demonstrations of their use in optical data storage.…”
mentioning
confidence: 99%
“…Two-photon polymerization (TPP) [11][12][13][14][15] based on laser direct writing is a powerful technology for the fabrication of flexible 3D structures in a controllable manner with high precision (,100 nm) by point-to-point scanning. This method has been used to integrate various 3D functional microdevices, [16][17][18][19][20] such as a microfilters, 16 mixers 18 or overpasses, 19 into a 2D microchannel for controllable filtering of particles, high-efficiency mixing of different solvents, and guiding of different fluids and cell migration, respectively.…”
Section: Introductionmentioning
confidence: 99%