Three-Dimensional Compatible Sacrificial Nanoimprint Lithography for Tuning the Wettability of Thermoplastic Materials

Abstract

We report the tuning of surface wetting through sacrificial nanoimprint lithography (SNIL). In this process, grown ZnO nanomaterials are transferred by imprint into a metallic glass (MG) and an elastomeric material, and then etched to impart controlled surface roughness. This process increases the hydrophilicity and hydrophobicity of both surfaces, the Pt57.5Cu14.7Ni5.3P22.5 MG and thermoplastic elastomer (TPE), respectively. The growth conditions of the ZnO change the characteristic length scale of the roughness, which in turn alters the properties of the patterned surface. The novelty of this approach includes reusability of templates and that it is able to create superhydrophilic and superhydrophobic surfaces in a manner compatible with the fabrication of macroscopic three-dimensional (3D) parts. Because the wettability is achieved by only modifying topography, without using any chemical surface modifiers, the prepared surfaces are relatively more durable.

Formation mechanism and compensation methods of profile error in focused ion beam milling of three-dimensional optical microstructures

“…These techniques have their own advantages and disadvantages such as high efficiency, resolution limit, complex steps, costly equipment, and material dependence [5][6][7][8]. Focused ion beam (FIB) milling combined with electron column (dualbeam system) a powerful technique for fabricating microand nano-structures (ranging from sub-50 nm to several tens of microns in size) with a high patterning flexibility on almost any material [9][10][11][12]. The technique has the distinctive advantage of direct writing with the ability to control pixel by the ion dose (dwell time), hence permitting to produce 3D patterns with relatively high aspect ratio and without the use of additional masks and resists [13,14].…”