“…Hydrogenated amorphous silicon (a-Si:H) thin-films are being developed by several methods, including plasma-enhanced chemical vapor deposition [1,2,3], hotwire chemical vapor deposition [4,5], sputtering [6,7,8], chemical annealing [9], and reactive pulsed laser deposition (PLD) [10,11,12,13], among others, resulting in various optical and electrical properties, film qualities and uniformities, and deposition rates. Reactive pulsed laser deposition allows for the development of hydrogenated silicon thin films via laser ablation of a silicon target in a hydrogen atmosphere.…”