2005
DOI: 10.1117/12.625146
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Thorium-free interference coatings for infrared applications

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“…193nm ArF excimer laser lithography has become the main lithography technology which is extending to below the 32nm node and results in drastically increasing requirements for high performance ArF excimer laser light source [3]. As the ArF excimer lasers are developed for higher output power and frequency, it is demanding on low-loss optical components inside the resonance cavity [4].…”
Section: Introductionmentioning
confidence: 99%
“…193nm ArF excimer laser lithography has become the main lithography technology which is extending to below the 32nm node and results in drastically increasing requirements for high performance ArF excimer laser light source [3]. As the ArF excimer lasers are developed for higher output power and frequency, it is demanding on low-loss optical components inside the resonance cavity [4].…”
Section: Introductionmentioning
confidence: 99%