Thomson scattering on argon surfatron plasmas at intermediate pressures: Axial profiles of the electron temperature and electron density

Palomares, J.M.; Iordanova, EI Ekaterina; Veldhuizen, E.M. van; Baede, Loek; Gamero, A; Sola, A; Mullen, J.J.A.M. van der

doi:10.1016/j.sab.2010.03.001

Cited by 34 publications

(53 citation statements)

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“…In Section 4 we will, just as in our previous study [6], find that the T e -similarity law that relates the T e to the product n a R of the gas density n a and plasma radius R is also not valid for the plasmas under study. This paper is organized as follows: Section 2 gives a theoretical background by comparing RyS with TS.…”

Section: Introductionmentioning

confidence: 74%

“…The fact that RyS and TS have much in common implies that the same setup initially developed for TS [6,21,22] can also be employed for RyS. Only minor adjustments are needed (cf.…”

Section: Theory Of Rys and Tsmentioning

confidence: 99%

“…1) consists of three main parts: the laser setup (on the left), the plasma tube (bottom right) and the detection system (top right). Since the setup was discussed in previous publications [6,21,22], we will only mention the main changes and give the information that is needed to make this paper self-contained. For the laser we used an Edgewave class IV that produces laser pulses at 532 nm with a repetition rate of 5 kHz, a duration of 10 ns and energy content of 4 mJ.…”

Section: The Experimental Setupmentioning

confidence: 99%

“…In many experimental and theoretical methods a lot of attention is paid to the properties of the free electrons {e}; see for instance [6] where the electron density n e and the electron temperature T e are determined using Thomson scattering (TS). However, in an atomic plasma of low ionization degree the main plasma constituent is the groundstate atom.…”

Section: Introductionmentioning

confidence: 99%

“…For the RyS measurements we use a similar setup as that used for TS measurements [6]. They are performed on surfatron induced plasmas in argon at intermediate pressure; the frequency is fixed at 2.45 GHz.…”

Section: Introductionmentioning

confidence: 99%

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Rayleigh scattering on a microwave surfatron plasma to obtain axial profiles of the atom density and temperature

Hübner

Iordanova

Palomares

et al. 2012

Eur. Phys. J. Appl. Phys.

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Please check the document version of this publication:• A submitted manuscript is the version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research.• You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal. Abstract. The axial dependency of the central-axis value of the heavy particle density and temperature of surface-wave plasmas is studied using Rayleigh scattering (RyS). The plasma is generated at a frequency of 2.45 GHz in argon by a surfatron operating under the standard settings of a power of 45 W, a flow rate of 50 sccm and a pressure of 20 mbar. To investigate the effect of the pressure on the gas temperature, we also investigated 6 and 10 mbar plasmas. By using a two-dimensional intensified CCD array we could determine and eliminate the influence of false stray light, a major disturbing factor in the determination of the Rayleigh signal. In order to trace the energy fluxes that determine the gas temperature, we performed Thomson scattering so that the properties of the electron gas are known. It is found that the gas temperature, T a, depends on the wall temperature and the product of the gas pressure and the electron pressure. The latter implies that Ta follows the electron density axially, meaning that it is highest at the launcher and decreases monotonically in the wave propagation direction. The maximum gas temperature of around Ta = 800 K is found close to the launcher for the highest gas pressure of 20 mbar. For lower pressures we find lower Ta values. The extrapolation of Ta toward the end of the plasma column leads to a temperature of about 320 K. This study reveals that, for the argon plasmas under study, the central-axis values of the gas temperature are determined by the balance between the heating of the gas by means of elastic electron collisions and the cooling due to heat conduction from the center to the wall.

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Section: Introductionmentioning

confidence: 74%

“…The fact that RyS and TS have much in common implies that the same setup initially developed for TS [6,21,22] can also be employed for RyS. Only minor adjustments are needed (cf.…”

Section: Theory Of Rys and Tsmentioning

confidence: 99%

Section: The Experimental Setupmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

Rayleigh scattering on a microwave surfatron plasma to obtain axial profiles of the atom density and temperature

Hübner

Iordanova

Palomares

et al. 2012

Eur. Phys. J. Appl. Phys.

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Microwave Plasma Systems in Optical and Mass Spectroscopy

Jankowski

Reszke²,

Broekaert

et al. 2011

Encyclopedia of Analytical Chemistry

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The art and science of microwave plasma (MWP) optical and mass spectroscopy is briefly presented including very recent advances in the field up to 2011. The use of MWPs as radiation sources for optical emission spectroscopy (OES) and atomic fluorescence spectroscopy (AFS) and as atom reservoirs for atomic absorption spectroscopy (AAS), cavity ringdown spectroscopy (CRDS), and laser‐enhanced ionization spectroscopy (LEIS) as well as ion sources for mass spectrometry (MS) is treated. Devices for producing both E‐type capacitively coupled microwave plasma (CMP)‐electrode and microwave‐induced plasma (MIP)‐electrodeless MWPs, including inductively coupled plasma (ICP)‐like H‐type plasmas, are classified and discussed, in addition to methods of their diagnostics, and results for the analytically relevant plasma parameters are presented. The means of generation of symmetrical plasmas and uses of microplasma devices are also presented with an effort to comment on general classification of microwave (MW) cavities. Further, the use of MWs for boosting of glow discharges (GDs) is treated along with other tandem sources. Methods for the introduction of gaseous, liquid, and solid samples into the MWP are discussed. They include direct vapor sampling (DVS), chemical vapor generation (CVG), and hydride generation (HG) techniques; dry aerosol generation techniques (electrothermal vaporization (ETV); spark ablation (SA); laser ablation (LA); and continuous powder introduction (CPI) as well as wet aerosol generation techniques using both solution and slurry nebulization. Special reference is made to coupling with gas chromatography (GC) and also with various separation techniques for liquids including high‐performance liquid chromatography (HPLC). The analytical figures of merit in the case of OES with low‐power and high‐power MIP, CMP, microwave plasma torch (MPT), MWP‐electrode sources including rotating field sustained plasma and H‐type MWP as well as microplasmas are given. There are also described cases of atomic absorption, fluorescence, and laser ionization with these sources. The developments in MS in the case of both low‐power and high‐power MWPs and in the case of various types of sample introduction techniques are discussed. Applications of MWP analytical spectroscopy are in the fields of biological samples with special reference to microanalysis, and of environmental and industrial samples with special emphasis on element speciation, on‐line monitoring, particle sizing, and direct solids analysis. A critical comparison of the methodology with other spectroscopic methods for the determination of the elements and their species is given.

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Microwave Plasma Systems in Optical and Mass Spectroscopy

Jankowski

Reszke²,

Broekaert

2016

Encyclopedia of Analytical Chemistry

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The art and science of microwave plasma (MWP) optical and mass spectroscopy is briefly presented including very recent advances in the field up to 2015. The use of MWPs as radiation sources for optical emission (OES) and atomic fluorescence (AFS) spectroscopy and as atom reservoirs for atomic absorption (AAS) and cavity ringdown (CRDS) spectroscopy as well as ion sources for both elemental and molecular mass spectrometry (MS) is treated. Devices for producing both E‐type capacitively coupled microwave plasma (CMP)‐electrode and microwave‐induced plasma (MIP)‐electrodeless MWPs, including ICP‐like H‐type plasmas, are classified and discussed, in addition to techniques of their diagnostics, and results for the analytically relevant plasma parameters are presented. The means of generation of voluminous symmetrical plasmas and uses of microplasma devices are also presented with an effort to comment on general classification of microwave cavities. Further, the use of microwaves for boosting of glow discharges (GDs) and laser‐induced plasmas (LIBS) is treated along with other tandem sources. Methods for introduction of gaseous, liquid, and solid samples into the MWP are discussed. They include direct vapor sampling (DVS), chemical vapor generation (CVG) and hydride generation (HG) techniques, dry aerosol generation techniques (electrothermal vaporization (ETV), spark (SA) and laser ablation (LA) and continuous powder introduction (CPI)), and wet aerosol generation techniques using both solution and slurry nebulization. Special reference is made to coupling with gas chromatography (GC) and also with various separation techniques for liquids including high‐performance liquid chromatography (HPLC), supercritical fluid chromatography (SFC), and size‐exclusion chromatography (SEC). The analytical figures of merit in the case of OES with MIPs, CMPs, microwave plasma torch (MPT), MWP‐electrode sources including rotating‐field‐sustained plasma, and H‐type MWP as well as microplasmas are given. There are also described cases of atomic absorption and fluorescence with these sources. The developments in both elemental and molecular MS in the case of both cold and hot MWPs and in the case of various types of sample introduction techniques are discussed. Applications of MWP analytical spectroscopy are in the fields of biological, clinical, environmental, and industrial samples with special reference to multielement analysis, element speciation, on‐line monitoring, particle sizing, and direct solids analysis. A critical comparison of the methodology with other spectroscopic methods for the determination of the elements and their species is given.

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Thomson scattering on argon surfatron plasmas at intermediate pressures: Axial profiles of the electron temperature and electron density

Cited by 34 publications

References 45 publications

Rayleigh scattering on a microwave surfatron plasma to obtain axial profiles of the atom density and temperature

Rayleigh scattering on a microwave surfatron plasma to obtain axial profiles of the atom density and temperature

Microwave Plasma Systems in Optical and Mass Spectroscopy

Microwave Plasma Systems in Optical and Mass Spectroscopy

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