Thin stoichiometric silicon nitride prepared by r.f. reactive sputtering

Fabrication and evaluation of SixNy coatings for total joint replacements

“…Ceramic coatings on metal substrates have therefore been suggested for the bearing components of joint replacements, including coatings of titanium nitride (TiN), diamond like carbon (DLC), chromium nitride (CrN), chromium carbon nitride (CrCN) and zirconium oxide (ZrO 2 ) [15][16][17][18]. Deposition processes for silicon nitride coatings for biomedical and other applications outside human body have also been described [19][20][21][22]. These processes include chemical vapour deposition (CVD) [20], ion-assisted deposition (IAD) [23], plasma immersion ion implantation and deposition (MPIID) [19], physical vapour deposition (PVD) [21,22] and plasma spray coating techniques [24].…”

“…Deposition processes for silicon nitride coatings for biomedical and other applications outside human body have also been described [19][20][21][22]. These processes include chemical vapour deposition (CVD) [20], ion-assisted deposition (IAD) [23], plasma immersion ion implantation and deposition (MPIID) [19], physical vapour deposition (PVD) [21,22] and plasma spray coating techniques [24]. Each technique exhibits advantages and disadvantages, for example plasma sprayed coatings present poor adhesion to the substrate while silicon nitride films produced with CVD results in hydrogenated films [16,22].…”

Refractive index control of silicon nitride films prepared by radio-frequency reactive sputtering

“…24,25,27,[40][41][42][43][44] In reactive sputtering, it is generally believed that the chemical reaction between silicon and nitrogen takes place ͑1͒ at the target, ͑2͒ in the plasma between electrodes, and ͑3͒ during growth at the substrate surface. 24,25,27,[40][41][42][43][44] In reactive sputtering, it is generally believed that the chemical reaction between silicon and nitrogen takes place ͑1͒ at the target, ͑2͒ in the plasma between electrodes, and ͑3͒ during growth at the substrate surface.…”

“…The refractive index of the film decreased continuously and was varied from 2.8 to 1.96. 15,[21][22][23][24][25][26][27][28][29][30][31][32] Radio-frequency ͑rf͒ reactive sputtering [21][22][23][24][25][26][27][28][29][30][31][32] can be used effectively to tailor the film properties. This method is well suited for fabricating multilayer structures of silicon nitride films with different refractive indices.…”

Effects of coating with different ceromers on the impact strength, transverse strength and elastic modulus of polymethyl methacrylate

“…These processes include physical and chemical vapor deposition [14][15][16][17][18] , ion-assisted deposition (IAD) 19) , plasma immersion ion implantation 20,21) , laser surface alloying 22) , thermal oxidation 23) , sol-gel technique [24][25][26][27][28] , and plasma spray coating techniques 24,29,30) . Each technique presents both advantages and disadvantages 24) .…”