Thin silicon carbonitride films are perspective low-k materials

Grazing incidence X-ray diffraction (GIRXD) study of the phase composition of SiC x Fe y and SiC x N y Fe z thin films

“…It was previously found that the films grown from TDEAS or HMDS are nanocomposite [13], so one can suppose that the above mentioned nanocrystals (α-Si 3 N 4 , β-SiC, α-FeSi 2 , FeSi and graphite) were introduced into the amorphous silicon carbonitride matrix. The similar results, including also the formation of the amorphous phase of silicon carbonitride during the chemical vapor deposition with organosilicon compounds as precursors, were obtained and described in [14,15]. Thus, in particular, in [14] the synchrotron radiation X-ray diffraction analysis confirmed the formation of α-Si 3 N 4 nanocrystals, and HRTEM and electron diffraction demonstrated the existence of the amorphous phase due to the presence of halo and ring system in the electron diffraction images.…”

“…Thus, in particular, in [14] the synchrotron radiation X-ray diffraction analysis confirmed the formation of α-Si 3 N 4 nanocrystals, and HRTEM and electron diffraction demonstrated the existence of the amorphous phase due to the presence of halo and ring system in the electron diffraction images. In [15] a more detailed study of the material was carried out by HRTEM and selected area electron diffraction. Therefore, the formation of the α-Si 3 N 4 phase and the presence of the amorphous component in silicon carbonitride films have been proved by two methods.…”

Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H2/N2/Ar/Hexamethyldisilazane Gas Mixture

“…Hexamethyldisilazane (HMDSN: (Me 3 Si) 2 NH) is interesting for SiC x N y :H deposition because it contains both Si-N and Si-C bond. [18][19][20][21][22][23] Recently, we have shown the versatility of N 2 /H 2 /Ar/HMDSN microwave plasma to grow SiC x N y :H coatings whose atomic composition and optical properties can be tuned on a large scale. [24] In a previous work, we have demonstrated that the effect of nitrogen addition is of importance in chemical and optical properties of SiCN:H thin films.…”

Новые Металлорганические Прекурсоры И Процессы Химического Осаждения Из Газовой Фазы В Технологиях Наноматериалов

“…Фазовый состав пленок карбонитрида кремния изучали методами РД с использованием синхротрон-ного излучения [21], КРС, ВРЭМ и микроэлектроно-графии [22,23]. Было показано, что пленки карбони-трида кремния являются нанокомпозитным мате-риалом, в аморфной матрице которого распределены нанокристаллы, имеющие фазовый состав, близкий к стандартной фазе α−Si 3 N 4 и фазе SiCN, а также име-ются примесные включения нанокристаллического графита.…”