2005
DOI: 10.1016/j.crci.2005.01.004
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Thin films of mesoporous silica: characterization and applications

Abstract: Characterization of mesoporous thin films and its implication in applications are presented in this report. It was found that optical, electrical and mechanical properties of mesoporous thin films prepared through surfactant templating are dependent on the film thickness, porosity, pore size and pore structure. A good understanding of the film properties thus becomes crucial to have a good handle on the electronic and optical applications of these materials.

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Cited by 33 publications
(15 citation statements)
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References 88 publications
(132 reference statements)
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“…After deposition of the solution onto the substrate, the ethanol evaporates and the concentration of water and surfactants increase. Hence, the surfactant concentration increases above CMC and micelles start to form on the substrate [188][189][190]. The process is illustrated in Figure 19.…”
Section: Evaporation-induced Self-assemblymentioning
confidence: 97%
“…After deposition of the solution onto the substrate, the ethanol evaporates and the concentration of water and surfactants increase. Hence, the surfactant concentration increases above CMC and micelles start to form on the substrate [188][189][190]. The process is illustrated in Figure 19.…”
Section: Evaporation-induced Self-assemblymentioning
confidence: 97%
“…The steeply decaying reflectivity curve is modified by several oscillations known as the Kiessig fringes. Film thickness and density can be derived from the frequency of the Kiessig fringes and θ c value [18,23] respectively. The XRR profiles of as-synthesized and UV-O 3 treated films as well as the XRR profile of dense SiO 2 film (of thickness~59 nm and density = 2.1 g/cm 3 ) are measured at ≤5% relative humidity and shown in Fig.…”
Section: Xrr Analysis Of Density and Thickness Of Filmsmentioning
confidence: 99%
“…Kr adsorption essentially reduces the uncertainty associated with equipment dead volume on the pore size distribution analysis [16]. The density and thickness of thin films on flat substrates have been measured by ellipsometry [17], X-ray reflectivity (XRR) or n&k analyzer [18]. XRR has been used to study morphology of ultra-thin films in semiconductor technology [17].…”
Section: Introductionmentioning
confidence: 99%
“…Depending on the intended application, such materials exhibit a wide variability of volume fraction, shape and arrangement of pores, which in turn affects their mechanical properties (Chao et al, 2005;Ha et al, 2010;Jauffrès et al, 2011;Vanstreels et al, 2013). Understanding the relation between pore microstructure and effective mechanical properties therefore plays a key role in successfully implementing these materials in practice.…”
Section: Introductionmentioning
confidence: 99%