2014
DOI: 10.1039/c4mh00049h
|View full text |Cite
|
Sign up to set email alerts
|

Thin film synthesis and properties of copper nitride, a metastable semiconductor

Abstract: Copper nitride (Cu3N) thin films were grown by reactive sputtering using a high-throughput combinatorial approach with orthogonal gradients of substrate temperature and target–substrate distance.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

6
136
0

Year Published

2015
2015
2024
2024

Publication Types

Select...
8
1

Relationship

4
5

Authors

Journals

citations
Cited by 130 publications
(145 citation statements)
references
References 50 publications
(58 reference statements)
6
136
0
Order By: Relevance
“…An RF-plasma atomic nitrogen source (HD25, Oxford Applied Research) run at 250 W and flowing 10 sccm of 99.999% purity N 2 gas was used to provide the reactive N* species for all films grown in this work. 20 Films were deposited on 50 x 50 mm Eagle XG glass substrates located 13 cm from the targets in a chamber with 10 -6 Torr residual water base pressure. Depositions were performed in a mixed Ar and N* atmosphere with 10 mTorr of each for a nominal chamber pressure of 20 mTorr.…”
Section: Methodsmentioning
confidence: 99%
“…An RF-plasma atomic nitrogen source (HD25, Oxford Applied Research) run at 250 W and flowing 10 sccm of 99.999% purity N 2 gas was used to provide the reactive N* species for all films grown in this work. 20 Films were deposited on 50 x 50 mm Eagle XG glass substrates located 13 cm from the targets in a chamber with 10 -6 Torr residual water base pressure. Depositions were performed in a mixed Ar and N* atmosphere with 10 mTorr of each for a nominal chamber pressure of 20 mTorr.…”
Section: Methodsmentioning
confidence: 99%
“…40 Another extreme case of reactive nitrogen precursors is atomic nitrogen, which can be made from the cracking of N 2 molecules in the plasma of reactive-sputtering processes. We previously used low-temperature reactive sputtering to synthesize thin-films of metastable Cu 3 N and Sn 3 N 4 semiconductors, 31,32 and determined from measured phase boundaries that this technique can yield nitrogen chemical potentials up to +1 eV/N above standard-state N 2 . A similar plasma-based synthesis was used to synthesize Na 3 N, which was also confirmed to be metastable.…”
Section: ■ Synthesis Strategy For Metastable Nitrogen-rich Nitridesmentioning
confidence: 99%
“…(2) We have experimentally demonstrated reactive sputtering with atomic nitrogen precursors as a technique to synthesize highly metastable nitride thin-films. 31,32 These two observations inspire the search for novel metastable nitrides in this relatively uncharted chemical space.…”
Section: ■ Introductionmentioning
confidence: 99%
“…56,57 The films were grown on Corning Eagle XG glass substrates at a temperature of 260 • C. During deposition, the total pressure was kept at 1.6 Pa with a mass flow ratio f O 2 /( f O 2 + f Ar) of 1.75% for the Sn 1−x Zn x O films and 2.25% for the pure SnO film, respectively. It is necessary to reduce the oxygen partial pressure in the sputtering atmosphere, to suppress the change of Sn valence state from Sn 0 via Sn 2+ to Sn 4+ due to the addition of Zn during the SnO synthesis.…”
mentioning
confidence: 99%