Thin film metallic glasses: Unique properties and potential applications

Chu, Jinn P.; Jang, J.S.C.; Huang, J.C.; Chou, H.S.; Yang, Yong; Ye, J. C.; Wang, Yun-Che; Lee, J. W.; Liu, F. X.; Liaw, Peter K.; Chen, Y. C.; Lee, C. M.; Li, Chung‐Lun; Rullyani, Cut

doi:10.1016/j.tsf.2012.03.092

Cited by 318 publications

(142 citation statements)

References 114 publications

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“…Thus, a wide spectrum of metallic alloys [23] and ceramics [24,25] can be deposited as amorphous films using a variety of PVD processes. Given that seed layers have been shown to influence the growth of ceramic nanostructures [26] as well, it is reasonable to expect that the methodology can be applied to a broad class of amorphously deposited materials.…”

Section: Discussionmentioning

confidence: 99%

Synthesis of thin films with highly tailored microstructures

Sarkar

Rajagopalan

2018

Materials Research Letters

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We report a new methodology to synthesize thin films with exceptional microstructural control via systematic, in-situ seeding of nanocrystals into amorphous precursor films. When the amorphous films are subsequently crystallized by thermal annealing, the nanocrystals serve as preferential grain nucleation sites and control their micro/nanostructure. We demonstrate the capability of this methodology by precisely tailoring the size, geometry and spatial distribution of nanostructured grains in structural (TiAl) as well as functional (TiNi) thin films. This synthesis methodology is likely to be applicable to other amorphously grown materials and enables explicit microstructural control in a wide spectrum of thin films/coatings. IMPACT STATEMENTThis paper describes a novel synthesis methodology to precisely tailor the microstructure of thin films and reveals the mechanisms underlying this methodology using in-situ TEM annealing experiments. ARTICLE HISTORY

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Section: Discussionmentioning

confidence: 99%

Synthesis of thin films with highly tailored microstructures

Sarkar

Rajagopalan

2018

Materials Research Letters

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“…The development of these pits can be explained on the basis of galvanic corrosion because of the combination of a noble element such as Cu (+0.35 V) and a base element such as Zr (−1.53 V) or Ti (−1.63 V) for Cu-Zr or Cu-Ti alloys. Due to the compositional heterogeneities between Cu and Zr or Cu and Ti in the glassy matrix, which facilitate the nucleation of pits [35], Cu-rich regions form at the metal-film interface after pit formation in Cu 60 Zr 30 Ti 10 . Enhanced local selective dissolution of active metals (Zr and Ti) occurs at some weak sites with physical or chemical defects, as a result of an autocatalytic reaction with Cl − ions.…”

Section: Corrosion Behavior Of Cu-zr-ti Bmg Alloysmentioning

confidence: 99%

Formation and Corrosion Behavior of Mechanically-Alloyed Cu–Zr–Ti Bulk Metallic Glasses

Lee

Cheng

Chen

et al. 2017

Metals

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Cu 60 Zr 30 Ti 10 metallic glass powder was prepared by mechanically alloying a mixture of pure Cu, Zr, and Ti powders after 5 h of milling. Cu 60 Zr 30 Ti 10 bulk metallic glass (BMG) was synthesized by vacuum hot pressing the as-milled Cu 60 Zr 30 Ti 10 metallic glass powder at 746 K in the pressure range of 0.72-1.20 GPa, and the structure was analyzed through X-ray diffraction and transmission electron microscopy. The pressure could enhance the thermal stability, and prolong the existence, of the amorphous phase inside the Cu 60 Zr 30 Ti 10 powder. Furthermore, the corrosion behavior of the Cu-based BMG in four corrosive media was studied using a potentiodynamic method. The Cu 60 Zr 30 Ti 10 BMG exhibited a low corrosion rate and current density in 1 N solutions of H 2 SO 4 , NaOH, and HNO 3 . X-ray photoelectron spectroscopy results revealed that the formation of Zrand Ti-rich passive oxide layers provides a high corrosion resistance against 1 N H 2 SO 4 and HNO 3 solutions, and the breakdown of the protective film by Cl − attack was responsible for pitting corrosion in a 3 wt % NaCl solution. The formation of oxide films and the nucleation and growth of pitting were analyzed through microstructural investigations.

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“…Thin film metallic glasses were also produced by solid-state amorphization of multilayer films. 26,27 A great benefit with thin films is that if prepared by vaporto-solid deposition, they are expected to be farther from thermodynamic equilibrium than the corresponding glasses that are prepared by liquid-to-solid melting and casting processes. This means that the glass-forming ability of vapor-to-solid deposited materials is larger, and that amorphization can be reached over a wider compositional range.…”

Section: Thin Film Metallic Glassesmentioning

confidence: 99%

Growth and Characterization of Amorphous Multicomponent Nitride Thin Films

Fager¹

2014

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This thesis explores deposition of amorphous thin films based on the two transition metal nitride systems, TiN and HfN. Additions of Si, Al and B have been investigated using three different deposition techniques: dc magnetron sputtering, cathodic arc evaporation, and high power impulse magnetron sputtering (HIPIMS). The effect of elemental composition, bonding structure, growth temperature, and low-energy ion bombardment during growth has been investigated and correlated to the resulting microstructure and mechanical properties of the films. The thermal stability has been investigated by annealing experiments. Deposition by cathodic arc evaporation yields dense and homogeneous coatings with essentially fully electron-diffraction amorphous structures with additions of either Al+Si, B+Si or B+Al+Si to TiN. The B-containing coatings have unusually few macroparticles. Annealing experiments show that Ti-Al-Si-N coatings have an age hardening behavior, which is not as clear for B-containing coatings. Compositional layering, due to rotation of the sample fixture during deposition, is present but not always visible in the as-deposited state. The layering acts as a template for renucleation during annealing. The coatings recrystallize by growth of TiN-rich domains. Amorphous growth by conventional dc magnetron sputtering is possible over a wide range of compositions for Ti-B-Si-N thin films. The Ti content in the films is reduced compared to the content in the sputtering target. Without Si, the films consist of a BN onion-like structure surrounding TiN nanograins. With additions of Si the films eventually grows fully amorphous. The growth temperature has only minor effect on the microstructure, due to the limited surface diffusion at the investigated temperature range (100-600 °C). Ion assisted growth leads to nanoscale densification of the films and improved mechanical properties. Ti-B-Si-N thin films are also deposited by a hybrid technique where dc magnetron sputtering is combined with HIPIMS. Here, the Ti:B ratio remains equal to the target composition. Films with low Si content are porous with TiN nanograins separated by BN-rich amorphous channels and have low hardness. Increasing Si contents yield fully electron-amorphous films with higher hardness. Finally, Hf-Al-Si-N single-layer and multilayer films are grown by dc magnetron sputtering from a single Hf-Al-Si target. Amorphous growth is achieved when the growth temperature was kept at its minimum. Low-energy substrate bias modulation is used to grow nanocomposite/nanocolumnar multilayers from the single Hf-Al-Si target, where the layers has essentially the same composition but different Si bonding structure, and different degree of crystallinity

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Thin film metallic glasses: Unique properties and potential applications

Cited by 318 publications

References 114 publications

Synthesis of thin films with highly tailored microstructures

Synthesis of thin films with highly tailored microstructures

Formation and Corrosion Behavior of Mechanically-Alloyed Cu–Zr–Ti Bulk Metallic Glasses

Growth and Characterization of Amorphous Multicomponent Nitride Thin Films

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