Ellipsometry at the Nanoscale 2013
DOI: 10.1007/978-3-642-33956-1_19
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Thin Film Applications in Research and Industry Characterized by Spectroscopic Ellipsometry

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Cited by 2 publications
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“…The thickness of chemically homogeneous and uniformly thick films can be measured with a variety of methods, including atomic force microscopy, 5,6 optical profilometry, 7,8 reflectometry, 9,10 ellipsometry [11][12][13][14][15] and Ultraviolet Spectral Reflectance [16][17][18][19][20][21][22] (UV-SR). ‡ The optical methods are direct, provide absolute thicknesses, and give an average value over a sample area in the micron range.…”
Section: Introductionmentioning
confidence: 99%
“…The thickness of chemically homogeneous and uniformly thick films can be measured with a variety of methods, including atomic force microscopy, 5,6 optical profilometry, 7,8 reflectometry, 9,10 ellipsometry [11][12][13][14][15] and Ultraviolet Spectral Reflectance [16][17][18][19][20][21][22] (UV-SR). ‡ The optical methods are direct, provide absolute thicknesses, and give an average value over a sample area in the micron range.…”
Section: Introductionmentioning
confidence: 99%