Thin Film and Significance of Its Thickness

Kumar, Sushil; Aswal, D. K.

doi:10.1007/978-981-15-6116-0_1

Cited by 7 publications

(7 citation statements)

References 22 publications

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“…Thin films are defined as 2D layers (i.e., they have one dimension negligible when compared to the two other dimensions), which are deposited by a progressive addition of atoms or molecules. , Usually, their thicknesses vary between subnanometers and several micrometers. The specific structure of thin films allows them to achieve properties that are not accessible by their bulk material.…”

Section: Introductionmentioning

confidence: 99%

High Sensitivity of Fluorine Gas-Assisted FIB-TOF-SIMS for Chemical Characterization of Buried Sublayers in Thin Films

Priebe

Pethő

Huszár

et al. 2021

ACS Appl. Mater. Interfaces

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In this work, we present the potential of high vacuum-compatible timeof-flight secondary ion mass spectrometry (TOF-SIMS) detectors, which can be integrated within focused ion beam (FIB) instruments for precise and fast chemical characterization of thin films buried deep under the sample surface. This is demonstrated on complex multilayer systems composed of alternating ceramic and metallic layers with thicknesses varying from several nanometers to hundreds of nanometers. The typical problems of the TOF-SIMS technique, that is, low secondary ion signals and mass interference between ions having similar masses, were solved using a novel approach of co-injecting fluorine gas during the sample surface sputtering. In the most extreme case of the Al/Al 2 O 3 /Al/Al 2 O 3 /.../Al sample, a <10 nm thick Al 2 O 3 thin film buried under a 0.5 μm material was detected and spatially resolved using only 27 Al + signal distribution. This is an impressive achievement taking into account that Al and Al 2 O 3 layers varied only by a small amount of oxygen content. Due to its high sensitivity, fluorine gas-assisted FIB-TOF-SIMS can be used for quality control of nano-and microdevices as well as for the failure analysis of fabrication processes. Therefore, it is expected to play an important role in the development of microelectronics and thinfilm-based devices for energy applications.

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Section: Introductionmentioning

confidence: 99%

High Sensitivity of Fluorine Gas-Assisted FIB-TOF-SIMS for Chemical Characterization of Buried Sublayers in Thin Films

Priebe

Pethő

Huszár

et al. 2021

ACS Appl. Mater. Interfaces

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show abstract

“…This value is very small compared to the overall composition of the formed electrode. From the thickness and molecular weight composition, the layers that were formed can be categorized as a thin film [26]. The fabricated Ag and Au thin films were later used as the geometric model in the electric field distribution simulation.…”

Section: Resultsmentioning

confidence: 99%

Electrochemical and Optical Analysis of Various Compositions of Au and Ag Layers for Blood Cancer Prognosis

et al. 2023

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The fabrication of silver (Ag) and gold (Au) thin film electrodes was successfully carried out using the DC sputtering deposition method. These thin film electrodes were able to detect the increase in serum albumin concentration that was used as a prognostic factor for leukemia. The simulation and the optical experimental analysis show that an increase in BSA concentration can increase the absorbance peak observed at a wavelength of 435 nm on hypoalbumin medium and 470 nm on normal concentration of serum albumin medium. The performance of the electrodes was electrochemically tested, in which it was shown that a decrease in oxidation and reduction peaks occurred with respect to an increase in BSA concentration. An oxidation peak was observed at a voltage of 0.5 V for the Ag thin film. For the Au, Au/Ag, and Ag/Au thin films, an oxidation peak was observed at a voltage of 1.0 V. The limits of detection (LODs) of the Ag, Ag/Au, Au, and Au/Ag thin films were 0.56, 0.24, 0.64, and 0.36 g/dL, respectively. Therefore, based on both the electrochemical and optical analysis, the Ag/Au thin film possessed the highest potential for prognosis monitoring of leukemia compared with the other Ag and Au thin films.

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“…Now-a-days thin film (TF) technology is advancing remarkably to develop novel materials namely nanomaterials, biomaterials, magnetic materials, graphene, metal-organic framework, etc. [ 1 , 2 ]. Zinc sulfide (ZnS) is a compound semiconductor of ӀӀ-VӀ group which has drawn the attention of many researchers due to its excellent properties and numerous potential optoelectronic and spintronic applications for example flat panel displays [ 3 ], injection lasers [ 4 ], light emitting diodes [ 5 ], cathode ray tubes [ 6 ], thin film luminescence [ 7 ], buffer layer in the solar cell [ 8 ], etc.…”

Section: Introductionmentioning

confidence: 99%

Surface topography, structural, optical and dc electrical behaviors of pristine and Co-doped ZnS thin films

Nasrin,

Khan,

Haq

et al. 2024

Heliyon

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Thin Film and Significance of Its Thickness

Cited by 7 publications

References 22 publications

High Sensitivity of Fluorine Gas-Assisted FIB-TOF-SIMS for Chemical Characterization of Buried Sublayers in Thin Films

High Sensitivity of Fluorine Gas-Assisted FIB-TOF-SIMS for Chemical Characterization of Buried Sublayers in Thin Films

Electrochemical and Optical Analysis of Various Compositions of Au and Ag Layers for Blood Cancer Prognosis

Surface topography, structural, optical and dc electrical behaviors of pristine and Co-doped ZnS thin films

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