High quality Lithium phosphate (Li 3 PO 4 ) thin films have been deposited by metal-organic chemical vapor deposition (MOCVD), using tert-butyllithium and trimethyl phosphate as precursors. The Li 3 PO 4 films deposited at 300 • C yielded the highest ionic conductivity (3.9 × 10 −8 S · cm −1 ). Increasing the deposition temperature led to crystallization of the deposited films and, consequently, to lower ionic conductivities. Kinetic studies on planar substrates showed that Li 3 PO 4 deposition is a diffusion-controlled process in the temperature range of 300 to 500 • C. Li 3 PO 4 films have also been deposited on highly structured substrates to investigate, for the first time, the feasibility of 3D deposition of Li 3 PO 4 by MOCVD. Furthermore, very thin films of Li 3 PO 4 have been deposited onto thin film Si anodes and it was found that these layers effectively suppress the SEI formation and dramatically improve the cycle performance of Si film anodes. Driven by the fast development of autonomous devices, all-solidstate micro-batteries currently attract a lot of attention. The three dimensional (3D) all-solid-state Li-ion battery is a challenging concept, which will significantly improve the volumetric capacity and rate capability of micro-batteries.1-3 A stable thin film electrolyte is one of the important components for micro-batteries. Due to the relatively high Li-ion conductivity and (electro)chemical stability upon contact with Li anodes, 4 lithium phosphate thin films are among the most popularly used electrolytes for micro-batteries.Lithium phosphate based thin film electrolytes are generally deposited by sputtering, 4-7 pulsed laser deposition 8 and E-beam evaporation.9 Because of shadow effects, these methods are hardly suitable for 3D deposition. In addition, during the deposition process using these methods, there is a temperature difference between the substrate and the deposited films. The resulting thermal tensile stress may disadvantageously cause film cracking.
10Atomic layer deposition (ALD) and metal-organic chemical vapor deposition (MOCVD) are two methods that can deposit very homogeneous and conformal films on highly structured substrates. Unfortunately, the ALD method is relatively slow 11 and therefore rather unpractical for the deposition of battery materials. Several papers reported the chemical vapor deposition of nitrogen doped lithium phosphate 10,12 but none of these papers explored the feasibility of deposition in 3D. In this study, MOCVD is investigated to deposit Li 3 PO 4 thin films, using tert-butyllithium (t-BuLi) and trimethyl phosphate (TMPO) as precursors. The MOCVD process for Li 3 PO 4 thin film deposition has been developed and the influence of the substrate temperature on the morphology, crystal structure and ionic conductivity has been systematically studied. In order to investigate the feasibility of three dimensional deposition of Li 3 PO 4 by MOCVD, thin films were also deposited onto highly-structured substrates. The thickness development of the deposited thin f...