Abstract:This work brings novel insights into the existing knowledge on the deposition of films containing boron (B), carbon (C), nitrogen (N), and aluminum (Al). The (Al)BCN films are obtained at low substrate temperatures ( T S) of 250–400 °C from triethylborane, ammonia (NH3), and trimethylaluminum. For BCN films, a nearly similar elemental composition of B0.42C0.41N0.15O0.02, with 1–2 at. % variations, is observed for substantial ranges of T S and NH3-exposure time. This can indicate a similar growth mechanism and/… Show more
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