2019
DOI: 10.1016/j.electacta.2019.134766
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Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery

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Cited by 18 publications
(20 citation statements)
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“…FET [111] W(CO) 6 + H 2 S 165-205 20-40 nm (amorp.) LIB [263] 400 175 nm rough films (≈5 nm) Lubricant [264] [ 265] W(CO) 6 + H 2 S plasma 350 3-20 nm films (3-7 nm) HER, NIB [266] 350 20-60 nm rough films (3-10 nm) NIB [267] W(N t Bu) 2 (NMe 2 ) 2 + H 2 S 300 ≈5-50 nm rough films (≈10-30 nm) HER [268] W(N t Bu) 2 (NMe 2 ) 2 + H 2 S plasma 300 ≈8-65 nm rough films (≈10-20 nm) HER [269] so far. On the other hand, there is still a need for even new MoS 2 processes with good ALD characteristics that produce smooth, high-quality films at low temperatures, for example.…”
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confidence: 99%
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“…FET [111] W(CO) 6 + H 2 S 165-205 20-40 nm (amorp.) LIB [263] 400 175 nm rough films (≈5 nm) Lubricant [264] [ 265] W(CO) 6 + H 2 S plasma 350 3-20 nm films (3-7 nm) HER, NIB [266] 350 20-60 nm rough films (3-10 nm) NIB [267] W(N t Bu) 2 (NMe 2 ) 2 + H 2 S 300 ≈5-50 nm rough films (≈10-30 nm) HER [268] W(N t Bu) 2 (NMe 2 ) 2 + H 2 S plasma 300 ≈8-65 nm rough films (≈10-20 nm) HER [269] so far. On the other hand, there is still a need for even new MoS 2 processes with good ALD characteristics that produce smooth, high-quality films at low temperatures, for example.…”
mentioning
confidence: 99%
“…≈40 nm rough film, cryst. 2019 [267] The measurements were performed in half-cells with the TMDC film directly grown on a stainless steel substrate (or TiO 2 nanotube substrate [219,221] ) without any binder or additives, a Li or Na metal counter electrode and a conventional electrolyte (LiPF 6 /NaPF 6 mixed with organic carbonate solvents). a) The discharge rates (C-rates) were calculated from the reported capacities and currents (1 C corresponds to a complete discharge of a battery in 1 h, 2 C in ½ h and so forth; b) The voltages are given versus Li/Li + (LIBs) or Na/Na + (NIBs); c) The italic gravimetric capacities were calculated from the reported mass loading, areal capacity (per geometric area), and film thickness;…”
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confidence: 99%
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“…The nucleation and growth mechanism of CVD differs in each synthetic process as the generation of 2D WS 2 lies in (1) vapor sources, (2) temperature, (3) atomic gas flux and (4) substrates. In case of the vapor sources, metal containing precursors (e.g., WS 2 [59], WO 3 [39,[60][61][62][63], WCl 6 [64], WF 6 [65,66] and W(CO) 6 [67]) are vaporized and then react with sulpur containing elements (S [39,68,69], H 2 S [63,65,66]) through vapor-solid reactions, leading to the growth of 2D WS 2 nanosheets on the substrate downstream. Generally, WO 3 is always the first choice as a cheap and easily handled precursor with relatively low melting and evaporation temperature [70].…”
Section: Gas-phase Synthesismentioning
confidence: 99%
“…Thus, Dip K. Nandi et al. employed an alternative stainless steel as support to load WS 2 nanosheets, which were successfully applied into sodium‐ion batteries . Using hexacarbonyl [W(CO) 6 ] and H 2 S plasma, a thin film WS 2 was grown with different thickness.…”
Section: Synthetic Strategiesmentioning
confidence: 99%