Thermometry in Steel Production

Iuchi, Tohru; Yamada, Yoshiro; Sugiura, M.; Torao, Akira

doi:10.1016/s1079-4042(09)04304-5

Cited by 5 publications

(3 citation statements)

References 37 publications

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“…It is believed that the measured surfaces having roughness such as steel sheets did not suit the applied technique which is based on reflection properties of specular surfaces. 7) In contrast, reflection at a semiconductor wafer surface retains a major specular component even for wafers with microstructure patterns. This observation lead us to attempt application of the polaradiometry to in situ measurement of wafer top surface temperature at the FLA.…”

Section: Principle Of the Automatic Emissivity Compensationmentioning

confidence: 99%

In situ Si Wafer Surface Temperature Measurement during Flash Lamp Annealing

Yamada

Aoyama²,

Chino³

et al. 2010

Jpn. J. Appl. Phys.

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Automatic emissivity compensating radiation thermometry based on polaradiometry was applied to in situ wafer surface temperature measurement on a flash lamp annealing prototype system. The developed temperature measurement system consists of a dual polarization radiation thermometer and a modulating reference light source, which were mounted on two opposing ports of the process chamber. The intense background radiation from the flash lamp was successfully suppressed by introducing a water flow layer beneath the flash lamp unit and measuring at the water absorption band of 1.95 µm. Millisecond heating and cooling of the wafer was measured for various operating conditions of the flash lamp and for various silicon wafers including wafers with microstructures. The peak temperature was compared with the sheet resistance after treatment and device properties after fabrication. Good correlation was confirmed between sheet resistance and measured peak temperature for various flash lamp intensities irrespective of the surface emissivity or heating conditions. Transistor threshold voltage showed similar correlation, which verifies the applicability of the developed thermometer system to in situ measurement during production.

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Section: Principle Of the Automatic Emissivity Compensationmentioning

confidence: 99%

In situ Si Wafer Surface Temperature Measurement during Flash Lamp Annealing

Yamada

Aoyama²,

Chino³

et al. 2010

Jpn. J. Appl. Phys.

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“…However, * Author to whom any correspondence should be addressed. unknown emissivity poses a major and also the most difficult problem when applying a radiation thermometer to temperature measurement of heated steel sheets especially in hightemperature furnaces [1].…”

Section: Introductionmentioning

confidence: 99%

“…To mitigate the effect of emissivity error, various emissivity-free radiation thermometry schemes have been exploited in the past [1]. These schemes can be categorized into mainly five types.…”

Section: Introductionmentioning

confidence: 99%

Emissivity-free radiation thermometry based on multivariate analysis of spectral radiance applied to steel-making process

Oshige¹,

Koshihara²,

Hirota³

et al. 2021

Meas. Sci. Technol.

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Unknown and varying emissivity is still one of the most important and the most difficult problems when radiation thermometers are applied to temperature measurement of heated sheet in steel-making processes. In previous reports, the authors proposed a new technique for emissivity-free temperature measurement by using spectral information of thermal radiation from targets and applying principal component analysis in order to overcome the problem of unknown and varying emissivity. More specifically, this is a passive method in which the principal component used for temperature measurement is experimentally determined in advance, and temperature is determined from the score (i.e. coefficient) of the principal component included in the measured spectrum of targets. This paper reviews the mathematical formulation of the concept and describes its application to a steel-making process to confirm the effectiveness of the technique.

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Toward Reliable Industrial Radiation Thermometry

Yamada

Ishii

2015

Int J Thermophys

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Thermometry in Steel Production

Cited by 5 publications

References 37 publications

In situ Si Wafer Surface Temperature Measurement during Flash Lamp Annealing

In situ Si Wafer Surface Temperature Measurement during Flash Lamp Annealing

Emissivity-free radiation thermometry based on multivariate analysis of spectral radiance applied to steel-making process

Toward Reliable Industrial Radiation Thermometry

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