Thermogravimetric analysis of InCl3 sublimation at atmospheric pressure

Karakaya, Canan; Ricote, Sandrine; Albin, David S.; Sánchez‐Cortezón, Emilio; Linares-Zea, Bélen; Kee, Robert J.

doi:10.1016/j.tca.2015.07.018

Cited by 13 publications

(10 citation statements)

References 40 publications

(62 reference statements)

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“…Temperatures greater than 300 °C are required for the desorption of the InCl 3 etch products. In support of this interpretation, the reported vapor pressure of InCl 3 is 0.18 Torr at 330 °C …”

Section: Resultsmentioning

confidence: 66%

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Spontaneous Etching of Metal Fluorides Using Ligand-Exchange Reactions: Landscape Revealed by Mass Spectrometry

et al. 2021

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Thermal atomic layer etching (ALE) can be performed using sequential reactions based on surface modification followed by volatile release of the modified surface layer. Surface modification can be accomplished using fluorination. Volatile release can then be achieved using precursors that undergo ligand-exchange reactions with the fluorinated surface layer. Metal fluorides can be employed to model the fluorinated surface layer. The ligand-exchange reaction between the precursor and the metal fluoride can lead to spontaneous etching of the metal fluoride. A new reactor with in situ quadrupole mass spectrometry (QMS) was constructed to observe the volatile etch products from the reaction of ligand-exchange precursors with metal fluoride powders. The metal fluoride powders were AlF3, HfF4, GaF3, InF3, and SnF4. The ligand-exchange precursors were Al(CH3)3, SiCl4, and TiCl4. A variety of studies were conducted including Al(CH3)3 + AlF3, SiCl4 + HfF4, SiCl4 + InF3, TiCl4 + SnF4, Al(CH3)3 + GaF3, and SiCl4 + AlF3. The temperature-dependent in situ QMS studies revealed the many possibilities that occur during the ligand-exchange reaction of precursors with metal fluoride powders. Various categories of behavior were observed from these studies: (i) Ligand exchange occurs at low temperature, but metal etch products from the substrate are not observed until high temperature. (ii) Ligand-exchange and metal etch products from the substrate are observed at similar temperatures. (iii) Ligand exchange occurs, but no metal etch products from the substrate are observed up to a limiting temperature. Knowledge of these possibilities for the ligand-exchange reaction between precursors and metal fluoride powders during spontaneous etching helps to further the understanding of thermal ALE.

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Section: Resultsmentioning

confidence: 66%

“…In support of this interpretation, the reported vapor pressure of InCl 3 is 0.18 Torr at 330 °C. 38 III.D. TiCl 4 + SnF 4 .…”

Section: Resultsmentioning

confidence: 99%

Spontaneous Etching of Metal Fluorides Using Ligand-Exchange Reactions: Landscape Revealed by Mass Spectrometry

et al. 2021

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“…The second step represents the sublimation of InCl 3 or the evaporation of GaCl 3 . 44,45 This second step is not observed for the GaCl 3 loaded ionic liquid measured under air. Probably hydrolysis takes place when moisture in air reacts with the GaCl 3 .…”

Section: Short-term Stabilitymentioning

confidence: 84%

Thermal stability of trihexyl(tetradecyl)phosphonium chloride

Deferm

Bossche

Luyten

et al. 2018

Phys. Chem. Chem. Phys.

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Dynamic TGA studies of phosphonium ionic liquids have reported thermal stabilities of 300 °C or higher for these compounds. This is often an overestimation of the real thermal stability. The chosen technique as well as the experimental parameters can influence the thermal stability. In this paper, the thermal stability of commercially available Cyphos IL 101 is studied. The effect of the nature of the atmosphere (air or inert gas), the purity of the sample, the heating rate and presence of a metal on the short-term and long-term stability of commercial Cyphos IL 101 is investigated. The thermal decomposition products are characterized using thermogravimetric analysis coupled to mass spectrometry (TGA-MS). Impurities present and higher heating rates lead to an under- and overestimation of the thermal stability, respectively. The presence of oxygen leads to a lower thermal stability. In contrast, adding metal chlorides to the ionic liquid causes an increase in the thermal stability. The chloride anions are coordinated to the metal ion, so that the Lewis basicity of the anions is reduced. Also this paper gives insights in the behavior of Cyphos IL 101 at high temperatures, which is of relevance for possible application of this ionic liquid in high-temperature industrial processes.

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“…This discrepancy could be attributed to the sublimation of small amounts of In as InCl 3(g) during thin lm annealing in air. 26 In the as-synthesized condition, the Ni 40 In 60 Ox thin lms display homogenous coverage of the glassy carbon surface as seen in the SEM image (Fig. 3a).…”

Section: Structural Evolution During Co 2 Reductionmentioning

confidence: 88%

“…This discrepancy could be attributed to the sublimation of small amounts of In as InCl 3(g) during thin lm annealing in air. 26 Aer a typical CO 2 electrolysis test between up to À1.0 V, the Ni-rich thin lms (NiO and Ni 75 -In 25 Ox) exhibit minor morphological changes (Fig. S3g and h †).…”

Section: Structural Evolution During Co 2 Reductionmentioning

confidence: 99%

CO₂ electroreduction activity and dynamic structural evolution of in situ reduced nickel-indium mixed oxides

et al. 2022

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Thermogravimetric analysis of InCl3 sublimation at atmospheric pressure

Cited by 13 publications

References 40 publications

Spontaneous Etching of Metal Fluorides Using Ligand-Exchange Reactions: Landscape Revealed by Mass Spectrometry

Spontaneous Etching of Metal Fluorides Using Ligand-Exchange Reactions: Landscape Revealed by Mass Spectrometry

Thermal stability of trihexyl(tetradecyl)phosphonium chloride

CO₂ electroreduction activity and dynamic structural evolution of in situ reduced nickel-indium mixed oxides

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Thermogravimetric analysis of InCl3 sublimation at atmospheric pressure

Cited by 13 publications

References 40 publications

Spontaneous Etching of Metal Fluorides Using Ligand-Exchange Reactions: Landscape Revealed by Mass Spectrometry

Spontaneous Etching of Metal Fluorides Using Ligand-Exchange Reactions: Landscape Revealed by Mass Spectrometry

Thermal stability of trihexyl(tetradecyl)phosphonium chloride

CO2 electroreduction activity and dynamic structural evolution of in situ reduced nickel-indium mixed oxides

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CO₂ electroreduction activity and dynamic structural evolution of in situ reduced nickel-indium mixed oxides