Mg 2 Si thin films were successfully fabricated on 125-¯m-thick flexible polyimide substrates by radio-frequency (RF) magnetron sputtering deposition using a sintered polycrystalline Mg 2 Si target. The crystalline orientation of the films was influenced by the substrate temperature (Ts). The produced films exhibit n-type carriers. The electron concentration and mobility of nondoped Mg 2 Si films at Ts = RT were 1.9 © 10 16 cm ¹3 and 1.2 cm 2 /(V s), respectively. The Seebeck coefficient was ¹748¯V/K at 336 K, and its absolute value decreased with increasing temperature. The power factor was 3.3 © 10 ¹7 W/(cm K 2 ) at 710 K, which is approximately one order of magnitude lower than that of the bulk sintered Mg 2 Si sample.