Vertical oriented GaN microrods were grown by metal-organic vapor phase epitaxy with four different n-type carrier concentration sections above 10 19 cm −3 along the c-axis. In cathodoluminescence investigations carried out on each section of the microrod, whispering gallery modes can be observed due to the hexagonal symmetry. Comparisons of the spectral positions of the modes from each section show the presence of an energy dependent mode shift, which suggest a carrier-induced refractive index change. The shift of the high energy edge of the near band edge emission points out that the band gap parameter in the analytical expression of the refractive index has to be modified. A proper adjustment of the band gap parameter explains the observed whispering gallery mode shift.
ExperimentalThe GaN microrod samples were grown by a self-catalyzed vapor-liquid-solid (VLS) method on 2 inch c-plane sapphire substrates utilizing an Aixtron 200RF horizontal flow metal-organic vapor phase epitaxy (MOVPE) reactor [12]. Trimethylgallium (TMGa), silane, hydrogen, and ammonia were used as precursors. Silane is needed for n-type doping and enhances the vertical growth due to the formation of surface SiN acting as a