1991
DOI: 10.1016/0022-0248(91)90320-5
|View full text |Cite
|
Sign up to set email alerts
|

Thermodynamic analysis of the deposition of GaAs epitaxial layers prepared by the MOCVD method

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

1995
1995
2017
2017

Publication Types

Select...
3
1

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(1 citation statement)
references
References 34 publications
0
1
0
Order By: Relevance
“…This has been performed for the expanded set of reactions beyond Eqn (21.1) associated with GaAs formation [18][19][20]. In actuality, there are a wide number of possible reaction byproducts in this system at thermodynamic equilibrium.…”
Section: Thermochemical Aspects Of the Movpe Growth Processmentioning
confidence: 99%
“…This has been performed for the expanded set of reactions beyond Eqn (21.1) associated with GaAs formation [18][19][20]. In actuality, there are a wide number of possible reaction byproducts in this system at thermodynamic equilibrium.…”
Section: Thermochemical Aspects Of the Movpe Growth Processmentioning
confidence: 99%