Here,
we propose a plasmon-induced redistribution of a thin polymer
layer as a unique way for a residual layer-free lithographic approach.
In particular, we demonstrate an ultrafast area-selective fabrication
method using a low-intensity visible laser irradiation to direct the
polymer mass flow, under the plasmon-active substrates. Plasmon-supported
substrates were created by thermal annealing of Ag thin films and
covered by thin polystyrene layers. Then, laser beam writing (LBW)
was applied to introduce a surface tension gradient through the local
plasmon heating. As a result, polystyrene was completely removed from
the irradiated place, without any residual layer. The proposed approach
does not require any additional development steps, such as solvent
or plasma treatment. To demonstrate the advantages of the proposed
technique, we implemented the LBW-patterned structures for further
spatially selective surface functionalization, including the metal
deposition, spontaneous thiol grafting, and electrochemical deposition
of ordered polypyrrole array.