2016
DOI: 10.1016/j.tsf.2016.06.038
|View full text |Cite
|
Sign up to set email alerts
|

Thermally induced formation of metastable nanocomposites in amorphous Cr-Zr-O thin films deposited using reactive ion beam sputtering

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
3
0

Year Published

2017
2017
2023
2023

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 8 publications
(3 citation statements)
references
References 30 publications
0
3
0
Order By: Relevance
“…Spitz et al mapped the phase formation and microstructure evolution in the Cr-Zr-O system over a wide range of Cr/Zr composition by reactive RF-magnetron sputtering, and showed that the system exhibits different phases: solid solution corundum structure at low Zr-content (< ~31 at%), cubic-(Zr,Cr)O 2 solid solutions at ~50 at % Zr, and monoclinic/tetragonal solid solution (Zr,Cr)O 2 for higher Zr-content [40]. Rafaja et al [42] investigated the influence of different annealing temperatures (i.e. 500 °C to 1100 °C) on the microstructure of as deposited amorphous Cr-rich Cr-Zr-O thin films with up to 15 at.% Zr content.…”
Section: Introductionmentioning
confidence: 99%
“…Spitz et al mapped the phase formation and microstructure evolution in the Cr-Zr-O system over a wide range of Cr/Zr composition by reactive RF-magnetron sputtering, and showed that the system exhibits different phases: solid solution corundum structure at low Zr-content (< ~31 at%), cubic-(Zr,Cr)O 2 solid solutions at ~50 at % Zr, and monoclinic/tetragonal solid solution (Zr,Cr)O 2 for higher Zr-content [40]. Rafaja et al [42] investigated the influence of different annealing temperatures (i.e. 500 °C to 1100 °C) on the microstructure of as deposited amorphous Cr-rich Cr-Zr-O thin films with up to 15 at.% Zr content.…”
Section: Introductionmentioning
confidence: 99%
“…Thus, the work of Rafaja et al is well in accordance with that of Spitz et al and demonstrates that the approach of combined deposition and annealing can be a valuable design tool to obtain advanced protective oxide thin films. 147…”
Section: B Cr-zr-omentioning
confidence: 99%
“…Rafaja et al [42] deposited amorphous Cr-rich Cr-Zr-O thin films with up to 15 at.% Zr content and performed in situ synchrotron-based X-ray diffraction (XRD) while vacuum annealing (500-1100°C). The Zr content in the hightemperature crystallized a-(Cr,Zr) 2 O 3 contained up to 3.2 at.% Zr, while the excess Zr formed tetragonal ZrO 2 , stabilized by Cr.…”
Section: Introductionmentioning
confidence: 99%