2004
DOI: 10.1063/1.1753650
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Thermal stability of epitaxial SrRuO3 films as a function of oxygen pressure

Abstract: Epitaxial growth and strain relaxation of MgO thin films on Si grown by molecular beam epitaxyDependence of crystallinity on oxygen pressure and growth mode of La 0.3 Sr 1.7 AlTaO 6 thin films on different substrates

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Cited by 75 publications
(55 citation statements)
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“…Similar planar defects, recognized as a double SrO layer, were discovered by Jia et al 35 at the BaTiO 3 / SrRuO 3 interface, formed at the temperature of 800°C and oxygen pressure of 2 ϫ 10 −3 mbar. Another case of a broadened interface on unknown composition between SrRuO 3 thin film and SrTiO 3 substrate was observed by Lee et al 36 Samples were high quality thin films deposited by PLD at 700°C and oxygen pressure of 0.13 mbar.…”
Section: -2mentioning
confidence: 96%
“…Similar planar defects, recognized as a double SrO layer, were discovered by Jia et al 35 at the BaTiO 3 / SrRuO 3 interface, formed at the temperature of 800°C and oxygen pressure of 2 ϫ 10 −3 mbar. Another case of a broadened interface on unknown composition between SrRuO 3 thin film and SrTiO 3 substrate was observed by Lee et al 36 Samples were high quality thin films deposited by PLD at 700°C and oxygen pressure of 0.13 mbar.…”
Section: -2mentioning
confidence: 96%
“…The electronic structure of SRO113 is located near to the half-metallicity as reported by density functional theory (DFT) + U calculations [15][16][17]. The thin film SRO113 is of particular interest as a widelyused bottom electrode [18][19][20] and is intensively studied for the possibility of a new field-effect device [21][22][23].…”
Section: Introductionmentioning
confidence: 99%
“…[1][2][3] In the perovskite crystal family ͑ABO 3 stoichiometry͒, the itinerant ferromagnetic SrRuO 3 ͑SRO͒ is a popular choice since it is one of the more conductive metallic oxides with good thermal properties. 4 In thin films, SRO is intensely investigated as a possible route to the realization of novel field-effect devices. 5,6 In addition, it is of particular interest to the spintronic 7,8 and multiferroic 9,10 communities, which have been recently energized by the possible device applications available from engineering interface phenomena.…”
Section: Introductionmentioning
confidence: 99%