2011
DOI: 10.1016/j.jallcom.2011.01.210
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Thermal stability of electrical properties of ZnO:Al films deposited by room temperature magnetron sputtering

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Cited by 11 publications
(2 citation statements)
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“…Similarly, XRD analyses were carried out on heattreated powders (Figure 5). It is evident from both the micrographs and the XRD patterns that the compound is not subject to any particular degeneration and/or morphological change between room temperature and 400 °C, proving that a ZnO material featuring thermal stability was obtained, in agreement with various literature reports on thermal stability of ZnO [77][78][79] in air. Calculation of crystallite size through Rietveld refinement also evidenced no notable changes: crystallite sizes remained around 70 nm both before and after treatment.…”
Section: Thermal Stability Testssupporting
confidence: 89%
“…Similarly, XRD analyses were carried out on heattreated powders (Figure 5). It is evident from both the micrographs and the XRD patterns that the compound is not subject to any particular degeneration and/or morphological change between room temperature and 400 °C, proving that a ZnO material featuring thermal stability was obtained, in agreement with various literature reports on thermal stability of ZnO [77][78][79] in air. Calculation of crystallite size through Rietveld refinement also evidenced no notable changes: crystallite sizes remained around 70 nm both before and after treatment.…”
Section: Thermal Stability Testssupporting
confidence: 89%
“…Chemical and thermal stability and strong anti-radiation damaging ability are important parameters which make ZnO as an attractive material in device physics [1,2]. ZnO thin films have been widely studied because of their potential applications such as gas sensors, solar cells, optoelectronic devices, transparent conducting electrodes and optical waveguides [3][4][5][6][7].…”
Section: Introductionmentioning
confidence: 99%