2011
DOI: 10.1007/s12666-011-0060-2
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Thermal stability of CeO2/ZrO2 multilayer thin films prepared by pulsed laser deposition

Abstract: Multilayers of CeO 2 /ZrO 2 thin films were deposited on Si (100) substrates using pulsed laser deposition at an optimized oxygen partial pressure of 3x10 -2 mbar and at room temperature. The CeO 2 layer thickness was 10 nm, while the ZrO 2 layer thickness was varied as 10, 20 and 30 nm. CeO 2 and ZrO 2 layers were deposited alternately to obtain 25 bilayers. High temperature x-ray diffraction (HTXRD) results showed that the multilayer films had cubic ceria and tetragonal ZrO 2. Thermal expansion coefficients … Show more

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Cited by 2 publications
(2 citation statements)
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“…These observations are consistent with other experiments, including our own, where alumina layers have been replaced by ceria [41][42][43][44][45][46][47] or yttria. [48][49][50][51][52][53][54] In the ceria/zirconia multilayer system the zirconia nanocrystallites have been observed to be stabilized in the tetragonal phase even at room temperature, whereas the thermally annealed CeO 2 /ZrO 2 multilayers at ∼1473 K shows the formation of solid solutions near the interfaces.…”
Section: Resultssupporting
confidence: 93%
“…These observations are consistent with other experiments, including our own, where alumina layers have been replaced by ceria [41][42][43][44][45][46][47] or yttria. [48][49][50][51][52][53][54] In the ceria/zirconia multilayer system the zirconia nanocrystallites have been observed to be stabilized in the tetragonal phase even at room temperature, whereas the thermally annealed CeO 2 /ZrO 2 multilayers at ∼1473 K shows the formation of solid solutions near the interfaces.…”
Section: Resultssupporting
confidence: 93%
“…Barshilia et al [21] have deposited TiN/CrN multilayers by sputtering technique and studied the thermal stability of the multilayers by HTXRD. Balakrishnan et al [10,11] have analyzed the thermal stability and thermal expansion behaviour of ZrO 2 /Al 2 O 3 and CeO 2 / ZrO 2 multilayer films deposited by pulsed laser (PLD) technique. Barshilia et al [12] have prepared ZrO 2 /Al 2 O 3 and ZrO 2 /Y 2 O 3 by sputtering technique and analyzed the microstructural and nanomechanical properties of the films.…”
Section: Introductionmentioning
confidence: 99%