Thermal stability of a freestanding EUV filter under long-term vacuum annealing at 700–1000°C

Gusev, S. A.; Дроздов, М. Н.; Kluenkov, E. B.; Lopatin, A. Ya.; Luchin, V. I.; Pariev, D. E.; Pestov, A. E.; Салащенко, Н. Н.; Tsybin, N. N.; Чхало, Н. И.; Shmaenok, L. A.

doi:10.1134/s1027451012060134

Cited by 4 publications

(2 citation statements)

References 6 publications

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“…27 The wrinkle profile of the EUV pellicle was simulated at different emissivity values (0.025, 0.05, 0.1, 0.2, and 0.4) and CTEs (0.5 × 10 −5 , 1 × 10 −5 , 2 × 10 −5 , and 4 × 10 −5 K −1 ). 17,[28][29][30][31] The CTE range was set according to the change in the CTE due to heating and oxidation. [32][33][34][35][36][37] The EUV pellicle deformation was assumed to be elastic, and nonlinear analysis was performed for large deflections.…”

Section: Fem Simulation Of a Wrinkle In The Slit Area Of The Euv Pelliclementioning

confidence: 99%

Impact of thermal expansion coefficient on the local tilt angle of extreme ultraviolet pellicle

Kim

Ahn

2022

J. Micro/Nanopattern. Mats. Metro.

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Background: A local tilt angle of <300 mrad results in a critical dimension uniformity (CDU) impact below 0.1 nm when a pellicle is used for extreme ultraviolet (EUV) lithography. However, the thermomechanical property guidelines satisfying this specification have not yet been established. Aim:We present the thermomechanical property guidelines that yield a CDU impact below 0.1 nm.Approach: The peak temperature ranges of the EUV pellicle, as a function of the emissivity, were calculated through experimental, numerical, and finite element method analyses. The wrinkle profiles were evaluated as a function of the coefficient of thermal expansion (CTE) within these temperature ranges. The emissivity and CTE values satisfying the specifications were obtained using the CDU impact caused by the wrinkled EUV pellicle. Results:The wrinkle amplitude in the EUV pellicle exhibited 45% attenuation with a twofold decrease in the CTE. The maximum local tilt angles for the 17, 16, and 15 nm half-pitch patterns were 290.2, 286.1, and 272.3 mrad, respectively. CTE below 2 × 10 −5 K −1 and emissivity above 0.1 are suggested for the EUV pellicle. Conclusions:The CTE and emissivity guidelines satisfying the CDU impact specifications can be used for developing next-generation EUV pellicles.

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Section: Fem Simulation Of a Wrinkle In The Slit Area Of The Euv Pelliclementioning

confidence: 99%

Impact of thermal expansion coefficient on the local tilt angle of extreme ultraviolet pellicle

Kim

Ahn

2022

J. Micro/Nanopattern. Mats. Metro.

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“…In this case, thick substrates can be used that will also make the thermal problem easier to deal with compared to thin transmission filters. 83 Antireflection coatings tailored for the (deep) UV wavelength range are applied in different cases, for lithography systems, high power lasers, 84 or solar cell applications. 85,86 To achieve the desired refractive index or index profile, special materials with a tailored composition or nanostructures were developed.…”

Section: Uv Anti-reflectionmentioning

confidence: 99%

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Huang

Медведев

Kruijs

et al. 2017

Applied Physics Reviews

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Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed.

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