1988
DOI: 10.1021/j100328a042
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Thermal properties of tetrakis(alkylthio)tetrathiafulvalenes

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Cited by 27 publications
(16 citation statements)
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“…(d) Melting points of TXC n -TTF 60,63,65,69 are compared with those of alkanes and alkyl alcohols. et al, [59][60][61][62][63][64][65][66][67][68][69] and TTC n -TTP (9) and its related molecule (10) by Mori, Misaki, et al 70,71 In the case of TTC n -TTF (Table 3), the melting point (T m ) decreases appreciably from n ¼ 1 to 4, since the alkyl chains prevent the %-% intermolecular interactions between C 6 S 8 moieties with each other as shown in Fig. 7c for n ¼ 1 59 and 2.…”
Section: Neutral Closed Shell Moleculementioning
confidence: 95%
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“…(d) Melting points of TXC n -TTF 60,63,65,69 are compared with those of alkanes and alkyl alcohols. et al, [59][60][61][62][63][64][65][66][67][68][69] and TTC n -TTP (9) and its related molecule (10) by Mori, Misaki, et al 70,71 In the case of TTC n -TTF (Table 3), the melting point (T m ) decreases appreciably from n ¼ 1 to 4, since the alkyl chains prevent the %-% intermolecular interactions between C 6 S 8 moieties with each other as shown in Fig. 7c for n ¼ 1 59 and 2.…”
Section: Neutral Closed Shell Moleculementioning
confidence: 95%
“…7a and 7b for X = S, n ¼ 9) by Inokuchi, Saito, der Waals interactions between the alkyl chains (red arrows) fasten the central C 6 S 8 %-moieties of TTC 9 -TTF tightly along the direction indicated by blue arrow to enhance the molecular overlap (labeled as fastener effect). 61,62,64,66 (c) Molecular stacking of TTC 1 -TTF 59 and TTC 2 -TTF 61 molecules in solid. (d) Melting points of TXC n -TTF 60,63,65,69 are compared with those of alkanes and alkyl alcohols.…”
Section: Neutral Closed Shell Moleculementioning
confidence: 99%
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“…The Parylene‐C layer was formed by chemical vapor deposition. Tetrakis(octadecylthio)tetrathiafulvalene (TTC 18 ‐TTF) was selected as a semiconductor layer test material, because its melting point is sufficiently low (85 °C) for the fabrication of a device on a plastic film, and it does not undergo chemical reaction at around the melting point. In addition, the melt viscosity of this material is sufficiently low for spreading in the narrow gap between the two substrates.…”
Section: Methodsmentioning
confidence: 99%
“…Parylene-C layer was formed by chemical vapor deposition. We selected a test material of TTC 18 -TTF (Tetrakis(octadecylthio) tetrathiafulvalene) as a semiconductor layer because melting point of this material is sufficiently low (85 o C [2] ) to make a device on the plastic film, and this molecule does not undergo any chemical reaction at around melting point. In addition, viscosity of the melt of this material is sufficiently low to make thin films.…”
Section: Methodsmentioning
confidence: 99%