Abstract:Abstract-Substrate energy flux in the inductively coupled plasma (ICP) assisted magnetron discharge has been measured by using a home-made thermal probe. The energy flux depends predominantly on the ICP power. In addition, substrate bias dependence of the substrate energy flux has been measured. As a result, it has been confirmed that the measured heat influx in an ICP is in good agreement with the theoretically calculated value within 30% error. Thus, substrate energy flux during the ICP assisted sputtering i… Show more
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