Thermal modeling of chemical vapor deposition on the particle surface subjected to nanosecond laser heating

Investigating atomic layer deposition characteristics in multi-outlet viscous flow reactors through reactor scale simulations

“…However, in this study, quantitative prediction of deposition rates is not our objective. As a result, in this numerical simulation, an undetailed chemistry mechanism is used to couple the chemistry and the transport model in ALD processes [27], which is a widely accepted practice as those used in [25][26][27][28][29][30][31][32][33].…”