“…Growth of ITO nanostructures using different methods has been reported [4][5][6][7][8][9][10][11][12][13][14][15][16], such as chemical vapor deposition [4,8,10,14,15], chemical synthesis [5], oblique-incidence electron-beam (ebeam) deposition [6,13], sol electrophoresis [7], sputtering [9,11], and thermal treatment [12]. Some of these methods, such as chemical vapor deposition [4,8,10,14,15] and thermal treatment [12], require a high growth temperature and thus would not be suitable for growth on glass substrates, which are of interest for low cost optoelectronic device applications. On the other hand, low temperature methods like chemical synthesis [5] result in free-standing nanostructures instead of nanorod/nanowire arrays/networks on the substrate.…”