Thermal desorption of tritium and helium in aged titanium tritide films

Effect of Thickness of Molybdenum Nano-Interlayer on Cohesion between Molybdenum/Titanium Multilayer Film and Silicon Substrate

“…Ti films and Mo interlayers were electron beam evaporated onto polished single crystal Si (110) substrates by using source materials of Ti bulk (PrMat, Shanghai, China, 99.99% purity, 25 mm in diameter) and Mo bulk (PrMat, Shanghai, China, 99.99% purity, 25 mm in diameter) [4,13]. Before deposition, the Si substrates were ultrasonically cleaned in ethanol and acetone and outgassed at 700 °C for 2 h in a chamber with a base vacuum pressure better than 2 × 10 −4 Pa.…”

“…The Mo interlayer was first grown on the Si substrate at a temperature of 500 °C, followed by Ti film evaporation on the Mo layer to form Si/Mo/Ti multilayer films. The Ti films were grown at a temperature of 700 °C to avoid the severe oxidation of the Ti-based getter material [4,46]. The evaporation rates detected by the IC5 thin film deposition controller were 15 nm/s and 2 nm/s for the Ti and Mo films, respectively.…”

“…Thin film materials maintain the fantastic properties of bulk materials [1,2,3,4,5,6] and have the significant advantages of being more economic [7], having small device size [4,5] and having the new physical performance of two-dimensional material [8,9,10]. Thin film materials have been used as functional devices in the applications of semi-conductors [2,8,9,10], metal hydrides [1,4,5,11,12,13], and solar cells [14,15], etc.…”

“…Thin film materials maintain the fantastic properties of bulk materials [1,2,3,4,5,6] and have the significant advantages of being more economic [7], having small device size [4,5] and having the new physical performance of two-dimensional material [8,9,10]. Thin film materials have been used as functional devices in the applications of semi-conductors [2,8,9,10], metal hydrides [1,4,5,11,12,13], and solar cells [14,15], etc. It is more conducive to the combination of multiple functional materials to form multilayer film materials [16,17], which can not only realize the unique characteristics of each material, but also give play to the characteristics of new interface materials [18,19,20] and improve their comprehensive performance [19,20,21,22,23].…”

“…Titanium film has the advantages of good hydrogen absorption performance, high thermal stability, and low room temperature equilibrium pressure. Ti film has been used as a metal hydride in the solid phase and has played an important role in the fields of hydrogen storage [35], solar thermal energy storage [36], and nuclear energy storage [4,37,38,39]. It has been reported that the surface morphology and grain size of Ti film on a Mo substrate was severely affected by the heterogeneity of polycrystalline Mo [4,38,40].…”