Thermal decomposition routes of CrN hard coatings synthesized by reactive arc evaporation and magnetron sputtering

Ernst, Wolfgang; Neidhardt, Jörg; Willmann, Herbert; Sartory, Bernhard; Mayrhofer, P.H.; Mitterer, Christian

doi:10.1016/j.tsf.2008.06.086

Cited by 59 publications

(10 citation statements)

References 25 publications

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“…ZrCl 4 or NbCl 5 react with Na 3 N in supercritical benzene to produce the mononitrides [60,61], as formed in the solid state reactions between these reagents [36]. However, the solvothermal reaction of CrCl 3 with Li 3 N yields CrN (decomposition temperature ~925 °C [62] [36]. Only in the case of Ta 3 N 5 produced from TaCl 5 and LiNH 2 or ammonia has a truly high oxidation state, nitrogen-rich composition been produced under solvothermal conditions [64,65].…”

Section: Ambient and Low Pressure Synthesis Approachesmentioning

confidence: 99%

Nitrogen-rich transition metal nitrides

Salamat

Hector

Kroll

et al. 2013

Coordination Chemistry Reviews

119

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The solid state chemistry leading to the synthesis and characterization of metal nitrides with N:M ratios > 1 is summarized. Studies of these compounds represent an emerging area of research. Most transition metal nitrides have much lower nitrogen contents, and they often form with nonor sub-stoichiometric compositions. These materials are typically metallic with often superconducting properties, and they provide highly refractory, high hardness materials with many technological applications. The higher metal nitrides should achieve formal oxidation states (OS) attaining those found among corresponding oxides, and they are expected to have useful semiconducting properties. Only a very few examples of such high OS nitrogen-rich compounds are known at present. The main group elements typically form covalently bonded nitride ceramics such as Si 3 N 4 , Ge 3 N 4 and Sn 3 N 4 , and the early transition metals Zr and Hf produce Zr 3 N 4 and Hf 3 N 4 . However, the only main example of a highly nitrided transition metal compound known to date is Ta 3 N 5 , that has a formal oxidation state +5 and is a semiconductor with visible light absorption leading to applications as a pigment and in photocatalysis. New synthesis routes are being explored to study the possible formation of other N-rich materials that are predicted to exist by ab initio calculations. There is a useful interplay between theoretical predictions and experimental synthesis studies at ambient and high pressure conditions, as we explore and establish the existence and structure-property relations of these new nitride compounds and polymorphs. Here we review the state of current investigations and indicate possible new directions for further work.[a] European Synchrotron Radiation Facility,

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Section: Ambient and Low Pressure Synthesis Approachesmentioning

confidence: 99%

Nitrogen-rich transition metal nitrides

Salamat

Hector

Kroll

et al. 2013

Coordination Chemistry Reviews

119

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“…23 Forming TiO 2 that is vulnerable to reactions with lithium resulting in the formation of Li 4 Ti 5 O 12 . 24 On the other hand, Cr 2 N has good mechanical properties and high thermal stability in vacuum up to 1120 C. [25][26][27] Furthermore, reactions with lithium is only observed at temperatures above 850 C for long dwell times. The oxidation of Cr 2 N begins between 650-700 C in air.…”

Section: Introductionmentioning

confidence: 99%

Chromium nitride as a stable cathode current collector for all-solid-state thin film Li-ion batteries

et al. 2017

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“…TiN and CrN are commonly used and well-studied hard coating materials [31,[35][36][37]. Fe-nitrides are less commonly used as hard coatings, although a limited number of studies have been conducted to examine their synthesis and mechanical properties [38][39][40].…”

Section: Discussionmentioning

confidence: 99%

The Effects of Ti Additions and Deposition Parameters on the Structural and Mechanical Properties of Stainless Steel-Nitride Thin Films

Alresheedi

Krzanowski

2019

Coatings

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This study examines the structure and properties of stainless steel coatings deposited to incorporate large concentrations of nitrogen along with varying amounts of titanium. Deposition was carried out using magnetron co-sputtering of stainless steel and titanium from separate targets in a mixed Ar/N2 gas atmosphere. Composition analysis by X-ray photoelectron spectroscopy showed that while films with up to 4 at.% Ti exhibited little change in nitrogen content (compared to films deposited without Ti) and remained sub-stoichiometric with respect to N content. Films with 7–8 at.% Ti had a higher N level and further increasing the Ti level to 11–12 at.% resulted in stoichiometric N levels. X-ray diffraction showed that the films all had a nominally FCC structure with no additional phases. However, the peak locations for the (111) and (200) reflections indicated a distorted lattice characteristic of the S-phase, with calculated c/a values ranging from 1.007 to 1.033. The Ti additions, along with the corresponding increase in N content, helped reduce the extent of lattice distortion. The film microstructure of the higher (11–12 at.%) Ti films also showed higher density, lower surface roughness, and a finer grain structure. As a result, these films had a higher hardness compared to the sub-stoichiometric films, with hardness levels in the range of 18–23 GPa, typical of transition metal nitrides coatings.

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Thermal decomposition routes of CrN hard coatings synthesized by reactive arc evaporation and magnetron sputtering

Cited by 59 publications

References 25 publications

Nitrogen-rich transition metal nitrides

Nitrogen-rich transition metal nitrides

Chromium nitride as a stable cathode current collector for all-solid-state thin film Li-ion batteries

The Effects of Ti Additions and Deposition Parameters on the Structural and Mechanical Properties of Stainless Steel-Nitride Thin Films

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