2018
DOI: 10.1007/s00339-018-1666-6
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Thermal conversion of Cu4O3 into CuO and Cu2O and the electrical properties of magnetron sputtered Cu4O3 thin films

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Cited by 36 publications
(16 citation statements)
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“…The activation energy was calculated as 0.10 and 0.20 eV at 100–180 and 190–370 K respectively, for the undoped Cu 4 O 3 , which lies in between those reported for CuO (0.12–0.16 eV) and Cu 2 O (0.20–0.24 eV) . It is also adjacent to the reported activation energy 0.14 eV of undoped Cu 4 O 3 although the measured temperature range was 190–300 K.…”
Section: Resultssupporting
confidence: 66%
“…The activation energy was calculated as 0.10 and 0.20 eV at 100–180 and 190–370 K respectively, for the undoped Cu 4 O 3 , which lies in between those reported for CuO (0.12–0.16 eV) and Cu 2 O (0.20–0.24 eV) . It is also adjacent to the reported activation energy 0.14 eV of undoped Cu 4 O 3 although the measured temperature range was 190–300 K.…”
Section: Resultssupporting
confidence: 66%
“…After substituting all required parameters such as an FWHM of 0.531, a crystalline size of 17 nm was calculated. The XRD analysis for the as‐deposited Cu 4 O 3 layer can be found in our recent article, which related well to the other reported literature …”
Section: Resultssupporting
confidence: 86%
“…Fig. 3 72 and Wang et al 71 The intensity of the (111) orientation is prominent for all our samples, and the annealing atmosphere does not drastically alter the orientation of the CuO phase in the lms. The dominating (111) orientation is typical for CuO lms when synthesized by thermal oxidation of Cu, or by transformation of a mixed oxide through heat treatment.…”
Section: X-ray Diffraction Analysissupporting
confidence: 57%