Herein, we report the design and scalable synthesis of three new Co(III) complexes, which have an unusual hydrocarbon η1‐alkyl‐η3‐allyl‐η5‐cyclopentadienyl ligation structure, from the reactions of readily available cobalt(II) compound CoCl2(PPh3)2 and biomass material β‐pinene via C−C bond activation. These Co(III) complexes are air‐stable, fairly volatile, and thermally stable, so they are excellent candidates as the metal precursors for the vapor deposition of cobalt‐containing thin films. As a demonstration, we show that the Co(III) complex of [(3’‐5’‐η,1‐σ)‐methylene(2,2,4‐trimethyl‐4‐cyclohexene‐1,3‐diyl)](η5‐methylcyclopentadienyl)Co (i. e. (seco‐pinene)(MeCp)Co) is well suited for the atomic layer deposition (ALD) of Co3O4 and CoS2 thin films, and the deposited Co3O4 and CoS2 films are able to conformally cover trench structures with a fairly high aspect ratio of 10 : 1.