Thermal Atomic Layer Etching of Molybdenum Using Sequential Oxidation and Deoxychlorination Reactions
Taewook Nam,
Troy A. Colleran,
Jonathan L. Partridge
et al.
Abstract:Thermal atomic layer etching (ALE) of molybdenum (Mo) was demonstrated using sequential exposures of O 3 (ozone) and SOCl 2 (thionyl chloride). In situ quartz crystal microbalance (QCM) studies were performed on sputtered Mo-coated QCM crystals. The QCM results revealed that Mo ALE displayed a linear mass decrease versus ALE cycles after a short etching delay. A pronounced mass increase was observed for every O 3 exposure. A dramatic mass decrease occurred for every SOCl 2 exposure. The mass change per cycle (… Show more
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