2015
DOI: 10.1016/j.mssp.2014.11.051
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Theoretical analysis of a novel dual gate metal–graphene nanoribbon field effect transistor

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Cited by 29 publications
(19 citation statements)
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“…A semiconductor device can control the output loop current by controlling the electric eld effect of the input loop, FET. [166][167][168][169][170][171][172][173][174][175][176][177][178][179][180][181][182][183][184] In 2013, researchers proved that by introducing edge defects, to achieve a higher pH response of graphene FET, edge defects can be introduced. The decrease in GNR width increases the pH response.…”
Section: The Eld-effect Transistor (Fet)mentioning
confidence: 99%
“…A semiconductor device can control the output loop current by controlling the electric eld effect of the input loop, FET. [166][167][168][169][170][171][172][173][174][175][176][177][178][179][180][181][182][183][184] In 2013, researchers proved that by introducing edge defects, to achieve a higher pH response of graphene FET, edge defects can be introduced. The decrease in GNR width increases the pH response.…”
Section: The Eld-effect Transistor (Fet)mentioning
confidence: 99%
“…Using linear and step-linear doping profiles for drain (source) in doped contact CNTFETs and GNRFETs can alleviate the short channel problems [14][15][16]. Dual-and triple-material gate structures which employ gate-material engineering with different work functions instead of doping engineering are another way to partially suppress the short channel effects in doped contact DG-GNRFETs [17].…”
Section: Journal Of Materialsmentioning
confidence: 99%
“…One type of graphene nanoribbon-based field-effect transistors (GNRFETs) is metal oxide semicondutor (MOS)-like GNRFET [7][8][9][10]. In the MOS-like GNRFET, applying a gate voltage can reduce the potential barrier at the channel region, leading to flowing of carriers from the top of the barrier and reaching the drain side.…”
Section: Introductionmentioning
confidence: 99%