2020
DOI: 10.1107/s1600577520010152
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The XFM beamline at the Australian Synchrotron

Abstract: The X-ray fluorescence microscopy (XFM) beamline is an in-vacuum undulator-based X-ray fluorescence (XRF) microprobe beamline at the 3 GeV Australian Synchrotron. The beamline delivers hard X-rays in the 4–27 keV energy range, permitting K emission to Cd and L and M emission for all other heavier elements. With a practical low-energy detection cut-off of approximately 1.5 keV, low-Z detection is constrained to Si, with Al detectable under favourable circumstances. The beamline has two scanning stations: a Kirk… Show more

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Cited by 82 publications
(57 citation statements)
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“…Polished thin sections of both samples (~70 × 25 mm at 30 μm thickness) were made using quartz glass (Ted Pella, Inc, Redding, California). These thin sections were mapped using microXRF (beamsize ~2 μm) and the Maia 384 detector at the XFM beamline of the Australian Synchrotron (Victoria, Melbourne, Clayton; Howard et al , 2020). Overview maps of each sample were made at 18.5 kV, 4 μm pixel size, 0.22 ms per pixel dwell time and a velocity of 18 mm/s.…”
Section: Methodology and Resultsmentioning
confidence: 99%
“…Polished thin sections of both samples (~70 × 25 mm at 30 μm thickness) were made using quartz glass (Ted Pella, Inc, Redding, California). These thin sections were mapped using microXRF (beamsize ~2 μm) and the Maia 384 detector at the XFM beamline of the Australian Synchrotron (Victoria, Melbourne, Clayton; Howard et al , 2020). Overview maps of each sample were made at 18.5 kV, 4 μm pixel size, 0.22 ms per pixel dwell time and a velocity of 18 mm/s.…”
Section: Methodology and Resultsmentioning
confidence: 99%
“…The XFM beamline at the Australian synchrotron 45 was used for elemental analysis of fingermark samples following previous studies published by Boseley et al, 31 and following the method published by Summers et al 46 In brief, a monochromatic micro-X-ray beam (15.8 keV, 2 µm spot size at 2 sigma) was focussed using a Kirkpatrick-Baez mirror pair. Data was collected in back-scatter geometry, with the sample mounted normal to incident X-ray source.…”
Section: Elemental Mapping and Xanes-mapping Using The Xfm Beamline At The Australian Synchrotronmentioning
confidence: 99%
“…The sensitivity to angular errors in optical components is lower in the horizontal direction because the photon source in the undu- lator is strongly elliptical in shape (see Table 1). Horizontally deflecting optics is the chosen design for several hard X-ray nanoprobe beamlines (Chang et al, 2013;Howard et al, 2020;Leake et al, 2019;Li et al, 2017;Quinn et al, 2021;Somogyi et al, 2015) at third-and fourth-generation sources.…”
Section: Beamline Opticsmentioning
confidence: 99%