1969
DOI: 10.1016/0040-6090(69)90093-5
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The variation of resistance of gold films with time and annealing procedure

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1972
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Cited by 23 publications
(7 citation statements)
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“…where D is the vacancy diffusivity and t is time, sub- From Eq. [2] and [3], the vacancy concentration, Cx (x, t), can be easily shown to be…”
Section: Theoretical Modelmentioning
confidence: 99%
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“…where D is the vacancy diffusivity and t is time, sub- From Eq. [2] and [3], the vacancy concentration, Cx (x, t), can be easily shown to be…”
Section: Theoretical Modelmentioning
confidence: 99%
“…Qn : (On2D 4-k)t [7] Determination of k The second term on the left-hand side of Eq. [2], kC~, represents the rate of the vacancy annihilation, which takes place at preexisting voids. This relation can then be expressed as kC~ = Ja4~aeNv [8] where Ja is the vacancy flux at a void surface, a the void radius, and Nv the void density.…”
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“…The temperature sensor SenGR1 showed annealing effects during the first and second tempering processes, [ 35 ] as reflected in a significant decrease in resistance at high temperatures (Figure S9c, Supporting Information). To characterize this behavior in detail, five cycles in which the temperature was varied from 23 to 98 °C were performed after curing of the epoxy (Figure 5f).…”
Section: Resultsmentioning
confidence: 99%