The Use of the TMA as Stabilizing Reagent for the Li-O System Obtained by Atomic Layer Deposition

Nazarov, D. V.; Ezhov, Ilya; Mitrofanov, Ilya; Lyutakov, Oleksiy; Maximov, Maxim

doi:10.4028/www.scientific.net/kem.822.787

Cited by 8 publications

(11 citation statements)

References 20 publications

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“…As the growth per cycle (GPC) of pristine nickel oxide (0.0118 ± 0.0010 nm) is significantly less than that of pristine lithium oxide (0.1225 ± 0.0008 nm), the average GPC of LNO naturally decreases with an increase in the number of Ni(Cp) 2 pulses in one supercycle (Figure 1a). The obtained experimental GPC values are very close to the values calculated based on the GPC of pristine nickel and lithium oxide [59,60].…”

Section: Atomic Layer Deposition and Growth Characteristicssupporting

confidence: 82%

“…The total oxygen plasma pulse time was 19.5 s (Ar purge during 0.5 s with flow rate 40 sccm; Ar and O 2 plasma purge during 14 s with flow rate 90 sccm; Ar purge during 5 s with flow rate 40 sccm). These deposition conditions were selected based on our previous studies devoted to obtaining lithium and nickel oxide [59,60].…”

Section: Methodsmentioning

confidence: 99%

“…However, to date, no study has been published on ALD of lithium nikelates or nickel-rich layered cathode materials; these might exhibit higher capacities (200-215 mAh/g) and possess an average potential near 3.6 V, which could improve the energy density of TFSSLIBs. Taking into account the results of our previous research on ALD of lithium oxide [59] and nickel oxide [60], we have tried to obtain lithium/nickel-based active cathode material and study its properties.…”

Section: Introductionmentioning

confidence: 99%

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Atomic Layer Deposition of Lithium–Nickel–Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries

et al. 2020

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Lithium nickelate (LiNiO2) and materials based on it are attractive positive electrode materials for lithium-ion batteries, owing to their large capacity. In this paper, the results of atomic layer deposition (ALD) of lithium–nickel–silicon oxide thin films using lithium hexamethyldisilazide (LiHMDS) and bis(cyclopentadienyl) nickel (II) (NiCp2) as precursors and remote oxygen plasma as a counter-reagent are reported. Two approaches were studied: ALD using supercycles and ALD of the multilayered structure of lithium oxide, lithium nickel oxide, and nickel oxides followed by annealing. The prepared films were studied by scanning electron microscopy, spectral ellipsometry, X-ray diffraction, X-ray reflectivity, X-ray photoelectron spectroscopy, time-of-flight secondary ion mass spectrometry, energy-dispersive X-ray spectroscopy, transmission electron microscopy, and selected-area electron diffraction. The pulse ratio of LiHMDS/Ni(Cp)2 precursors in one supercycle ranged from 1/1 to 1/10. Silicon was observed in the deposited films, and after annealing, crystalline Li2SiO3 and Li2Si2O5 were formed at 800 °C. Annealing of the multilayered sample caused the partial formation of LiNiO2. The obtained cathode materials possessed electrochemical activity comparable with the results for other thin-film cathodes.

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Section: Atomic Layer Deposition and Growth Characteristicssupporting

confidence: 82%

Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Atomic Layer Deposition of Lithium–Nickel–Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries

et al. 2020

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“…Notably in many cases, O 3 was found to react with C-containing ,− and Si-containing ,, precursors in a way that incorporated those elements into the film. In later experiments, the same was seen using O 2 -plasma with C-containing precursors. − …”

Section: Lithium-based Ald Processesmentioning

confidence: 52%

Atomic and Molecular Layer Deposition of Alkali Metal Based Thin Films

Madadi

Heiska

Multia

et al. 2021

ACS Appl. Mater. Interfaces

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Atomic layer deposition (ALD) is the fastest growing thin-film technology in microelectronics, but it is also recognized as a promising fabrication strategy for various alkali-metal-based thin films in emerging energy technologies, the spearhead application being the Li-ion battery. Since the pioneering work in 2009 for Li-containing thin films, the field has been rapidly growing and also widened from lithium to other alkali metals. Moreover, alkali-metal-based metal–organic thin films have been successfully grown by combining molecular layer deposition (MLD) cycles of the organic molecules with the ALD cycles of the alkali metal precursor. The current literature describes already around 100 ALD and ALD/MLD processes for alkali-metal-bearing materials. Interestingly, some of these materials cannot even be made by any other synthesis route. In this review, our intention is to present the current state of research in the field by (i) summarizing the ALD and ALD/MLD processes so far developed for the different alkali metals, (ii) highlighting the most intriguing thin-film materials obtained thereof, and (iii) addressing both the advantages and limitations of ALD and MLD in the application space of these materials. Finally, (iv) a brief outlook for the future perspectives and challenges of the field is given.

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“…The method is based on self-limiting reactions of a gas-phase reagent with a substrate surface [1,2]. Due to its peculiar properties, the process makes it possible to create uniform coatings on substrates of complex shapes such as high-aspect structures [3,4]. Therefore, the energy capacity of the battery can be increased, which has a positive effect on the device's autonomy.…”

Section: Introductionmentioning

confidence: 99%

APPLICATION OF MANGANESE OXIDE THIN-FILMS obtained by ALD for LI-ion batteries ANODE

Ezhov

Vishniakov

Mitrofanov

et al. 2020

NANOCON Conference Proeedings

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Thin-film solid-state lithium-ion batteries can provide autonomous operation of miniature devices (biosensors, smartwatches, medical devices, etc.). In this work, we investigated the processes of obtaining thin films of manganese oxide by atomic layer deposition (ALD), and their electrochemical activity as an anode of a lithiumion battery (LIBs). Tris (2,2,6,6-tetramethyl-3,5-heptanedionato) manganese (III) (Mn(thd)3) was used as an Mn precursor, and remote oxygen plasma was used as a co-reactant. Each pulse of Mn(thd)3 and remote plasma treatment were separated by N2 purge and evacuation of the reactor. The deposition of manganese oxide films was carried out on silicon (100) and stainless steel (316SS, 16 mm in diameter) substrates at the temperature of 250-300 °C. The effect of the precursor sublimation temperature, the pulse of manganese precursor, and purge time on the growth rate per cycle was studied. The average growth per cycle calculated from film thickness measurements (spectral ellipsometry) varied from 0.06 to 0.12 Å/cycle. Using X-ray photoelectron spectroscopy (XPS), the compositions of the deposited films were determined. According to XPS results, the formation of Mn2O3 oxide occurred during deposition. The change in the shape of the curves of cyclic voltammetry as a result of cyclic charge/discharge relative to lithium is discovered. The maximum capacity observed at 0.8 С-Rate (30 µA) was 110 µAh•µm -1 •cm -2 for a steel substrate with a manganese oxide layer.

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The Use of the TMA as Stabilizing Reagent for the Li-O System Obtained by Atomic Layer Deposition

Cited by 8 publications

References 20 publications

Atomic Layer Deposition of Lithium–Nickel–Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries

Atomic Layer Deposition of Lithium–Nickel–Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries

Atomic and Molecular Layer Deposition of Alkali Metal Based Thin Films

APPLICATION OF MANGANESE OXIDE THIN-FILMS obtained by ALD for LI-ion batteries ANODE

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