2002
DOI: 10.1007/s00216-002-1250-x
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The use of silylation for minimizing the interference effects caused by contamination in ultra-low level mercury analytics

Abstract: The use of silylation of glassware in mercury analytics was investigated. By treating the glassware with 5% (v/v) dichlorodimethylsilane in toluene, the surfaces of the vessels were inactivated. Method development proved that silylation can extend the range of stabile, contamination-free area as low as 1 ng/L mercury without any significant investments in laboratory clean-room facilities. The resilylation had to be done once a month.

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“…The following were the reactor optimization process employed in order to prevent its inner wall from adsorbing DMMP: the use of a Teflon O-ring as sealing material, by silane application to the interior wall, and the temperature control with ribbon heater. Silane application using 5% (w/v) dichlorodimethylsilane toluene solution (Wako Pure Chemical Industries, Ltd., Osaka, Japan) was performed following the instruction manual [9] and the procedure described by Näykki [10]. After DMMP concentration in the reactor became stable, valves were closed on both sides to obtain batch condition and DMMP was photocatalytically decomposed with UV irradiation above upside under high temperature (100 • C) and room temperature (27 • C) conditions.…”
Section: Tio 2 -Plate Reagents and Lightingmentioning
confidence: 99%
“…The following were the reactor optimization process employed in order to prevent its inner wall from adsorbing DMMP: the use of a Teflon O-ring as sealing material, by silane application to the interior wall, and the temperature control with ribbon heater. Silane application using 5% (w/v) dichlorodimethylsilane toluene solution (Wako Pure Chemical Industries, Ltd., Osaka, Japan) was performed following the instruction manual [9] and the procedure described by Näykki [10]. After DMMP concentration in the reactor became stable, valves were closed on both sides to obtain batch condition and DMMP was photocatalytically decomposed with UV irradiation above upside under high temperature (100 • C) and room temperature (27 • C) conditions.…”
Section: Tio 2 -Plate Reagents and Lightingmentioning
confidence: 99%