“…The following were the reactor optimization process employed in order to prevent its inner wall from adsorbing DMMP: the use of a Teflon O-ring as sealing material, by silane application to the interior wall, and the temperature control with ribbon heater. Silane application using 5% (w/v) dichlorodimethylsilane toluene solution (Wako Pure Chemical Industries, Ltd., Osaka, Japan) was performed following the instruction manual [9] and the procedure described by Näykki [10]. After DMMP concentration in the reactor became stable, valves were closed on both sides to obtain batch condition and DMMP was photocatalytically decomposed with UV irradiation above upside under high temperature (100 • C) and room temperature (27 • C) conditions.…”