The Use of Porous Silicon for Nanostructuring of Functional Metal Layers for MEMS

Abstract

The results of studies relating to the use of porous silicon as the basis for the creation of nanostructured getter layers for MEMS are presented. New technical solutions, in which the porous silicon with pores of micro- and nanometer range is used as a matrix for the deposition of reactive metals or metal alloys, were developed. The research results can be used to create getters for MEMS, as well as in other areas which require the creation of structures with a developed surface.

Utilization of Low Wavelength Laser Linking with Electrochemical Etching to Produce Nano-Scale Porous Layer on p-Type Silicon Wafer with High Luminous Flux

“…A black, thin layer that formed on the surface of the wafer was accidentally discovered and called porous silicon. After several decades, porous silicon was extensively studied for various applications, such as MEMS, 2 semiconductor devices, 3 solar cells and biomedical engineering. 4,5 In this study, PS was formed either by electrochemical anodisation (ECA), etching in HF-based solution or by chemical etching by oxidation reaction.…”