The use of microfilm computer plotting facilities for generating optical-diffraction masks

Abstract

The paper describes the use of computer generated microfilm masks and briefly discusses their advantages over more traditional methods of preparation.

Computer simulation of electron microscope images on 35 mm film

“…However, many of those systems often require specialized hardware which is not always readily available. The use of microfilm plotter facilities accessible at some large computer centres has already been described (Fowler et al, 1973;Burge & Scott, 1975) in connection with optical diffraction and image processing studies. In this paper we shall consider the application of such facilities for simulating calculated images with particular reference to the case of single sheets of carbon.…”