The tribological characteristics of titanium nitride, titanium carbonitride and titanium carbide coatings

Guu, Yeong Yan; Lin, Jen Fin; Ai, Chi-Fong

doi:10.1016/s0040-6090(96)09546-6

Cited by 43 publications

(16 citation statements)

References 11 publications

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“…However, TiC, as with other interstitial carbides, is essentially a nonstoichiometric compound with usually carbon vacancies. Due to its excellent hardness (hardness: 3200 kg/mm 2 ), high strength and rigidity (Young's modulus: 3.70 × 10 11 Pa), outstanding wear resistance, and low friction coefficient (0.522), TiC has become a major industrial coating material in many tribological applications [1][2][3][4][5]. Moreover, thanks to its dense interstitial structure, high conductivity (electrical resistance: 68 μΩ cm), and high chemical (essentially unaffected by acids and aqueous alkali.…”

Section: Introductionmentioning

confidence: 99%

Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization

Choi

Kim

et al. 2015

Thin Solid Films

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Section: Introductionmentioning

confidence: 99%

Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization

Choi

Kim

et al. 2015

Thin Solid Films

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“…TiN thin films have been produced by various techniques, all derivatives of those used in semiconductor processing, such as electroplating [14], laser ablation [15,16], chemical vapor deposition (CVD) [17], as well as the physical vapor deposition (PVD) techniques of evaporation and sputtering, reactive or otherwise [18][19][20][21][22]. Much of the problem associated with their production has been the need for high voltages and temperatures, which limit their integration within CMOS process flows.…”

Section: Introductionmentioning

confidence: 99%

Pressure and Temperature Effects on Stoichiometry and Microstructure of Nitrogen‐Rich TiN Thin Films Synthesized via Reactive Magnetron DC‐Sputtering

Penilla

Wang

2008

Journal of Nanomaterials

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Nitrogen-rich titanium nitride (TiN) thin films containing excess nitrogen up to 87.0 at.% were produced on (100) Si substrates via the reactive magnetron DC-sputtering of a commercially available 99.995 at.% pure Ti target within an argon-nitrogen (Ar-N 2 ) atmosphere with a 20-to-1 gas ratio. The process pressure (P P ) and substrate temperature (T S ) at which deposition occurred were varied systematically between 0.26 Pa-1.60 Pa and between 15.0• C-600• C, respectively, and their effects on the chemical composition, surface morphology, and preferred orientation were characterized by energy dispersive X-ray spectroscopy (EDS), field emission scanning electron microscopy (FE-SEM), and X-ray diffraction (XRD). The EDS analysis confirms increasing nitrogen content with increasing P P and T S . The SEM images reveal a uniform and crystallized surface morphology as well as a closely packed cross-sectional morphology for all crystalline films and a loosely packed cross-sectional morphology for amorphous films. Films produced at lower P P and T S have a pyramidal surface morphology which transitions to a columnar and stratified structure as P P and T S increase. The XRD analysis confirms the existence of only the δ-TiN phase and the absence of other nitrides, oxides, and/or sillicides in all cases. It also indicates that at lower P P and T S , the preferred orientation relative to the substrate is along the (111) planes, and that it transitions to a random orientation along the (200), (220), and (311) planes as P P and T S increase and these results correlate with and qualify those observed by SEM.

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“…These layers are mainly constituted by borides, carbides, nitrides and carbonitrides of transition metals [4][5][6][7] . Ceramic coatings of titanium compounds (TiN, TiC, and TiCN) are generally used for this purpose [8][9][10][11] . However, its cost is high due to the considerable value of titanium sources (titanium chloride, ferrotitanium, and metallic titanium), and the equipment employed in its manufacture.…”

Section: Introductionmentioning

confidence: 99%

Deposition of Multicomponent Chromium Carbide Coatings Using a Non-Conventional Source of Chromium and Silicon with Micro-Additions of Boron

et al. 2017

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The chromium carbide coatings are widely used in the mechanical industry due to its corrosion resistance and mechanical properties. In this work, we evaluated a new source of chromium and silicon with micro-additions of boron on the deposition of multi-component coatings of chromium carbides in W108 steel. The coatings were obtained by the pack cementation method, using a simultaneous deposition at 1000 o C for 4h. The coatings were analyzed by X-ray diffraction, X-ray energy dispersive spectroscopy, optical microscopy, microhardness test method and pin-on-disc wear test. It was found that the coatings formed on W108 steel were mainly constituted by (Cr,Fe) 23 C 6 , (Cr,Fe) 7 C 3 , Cr 5-x Si 3-x C x+z , Cr 3 B 0,44 C 1,4 and (or) Cr 7 BC 4 . The carbide layers showed thicknesses between 14 and 15 µm and maximum values of microhardness between 15.8 and 18.8 GPa. Also, the micro-additions of boron to the mixtures showed statistically significant influence on the thickness, microhardness and abrasive wear resistance of the carbide coatings.

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The tribological characteristics of titanium nitride, titanium carbonitride and titanium carbide coatings

Cited by 43 publications

References 11 publications

Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization

Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization

Pressure and Temperature Effects on Stoichiometry and Microstructure of Nitrogen‐Rich TiN Thin Films Synthesized via Reactive Magnetron DC‐Sputtering

Deposition of Multicomponent Chromium Carbide Coatings Using a Non-Conventional Source of Chromium and Silicon with Micro-Additions of Boron

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