The trend of electron temperature and electron density in the process of microcrystalline silicon solar cells

Investigation of radio frequency plasma for the growth of diamond like carbon films

“…Theoretical aspect of power dissipation in RF plasma as a function of RF-current Various research groups have performed theoretical and experimental studies of the plasma parameters as a function of external parameters such as gas pressure, magnetic field, driving frequency, RF current, and RF power. [15][16][17][18][19][20][21][22][23][24][31][32][33] On the basis of theoretical calculations, Beneking 15 have derived empirical formulas for the estimation of plasma parameters when plasma is in power dissipation mode. They suggested that the plasma impedance is a very critical deciding parameter for the behavior of plasma characteristic.…”

“…You et al [18][19][20] have shown the experimental verification of power dissipation transition mode with different RF frequency, magnetic field, and gas pressure for argon gas plasma. On the other hand, Lee et al 23,24 showed the power dissipation mode for the inert gas such as argon, neon, krypton and for reactive silane gas for solar cell application.…”

“…[18][19][20][21][22][23][24] But, still there is one more uncovered deposition parameter i.e., self-bias, which strongly controls the properties of thin films during deposition. The properties of diamond like carbon thin films deposited by PECVD technique depends upon various process parameters such as RF power, RF frequency, gas pressure, type of gas or gaseous mixture, self-bias and system geometry, etc.…”

“…Thus, the ion energy is one of the most important parameter for the properties of the DLC films. [15][16][17][18][19][20][21][22][23][24] The electrical properties of the DLC films are governed by sp 2 hybridized carbon atoms, while the mechanical properties are depend upon the sp 3 hybridization of the carbon atoms. Enormous research has been carried out by various research groups 52-64 on the effect of self-bias on diamond like hard coatings.…”

“…[15][16][17][18][19][20][21][22][23][24][25][26][27][28][29][30] In this context, several plasma diagnostic tools such as Langmuir probe, optical emission spectroscopy (OES), mass spectrometry, impedance probe analyzer, etc., have been used by several research groups. 1-5, [15][16][17][18][19][20][21][22][23][24][25][26][27][28][29][30] However, it is difficult for a single diagnostic tool to give complete information about the physical and chemical processes of the plasma discharge. Impedance probe analyzer has shown its usefulness in plasma diagnostic by monitoring the RF voltage and current and the phase difference between them, which finally leads to estimate the plasma impedance for power dissipation.…”