The Thermal Oxidation Effect of the Single Crystal Silicon (100) on the Magnetic Properties of Ultra-Thin Films of Cobalt.

Abstract

We studied the systems Au/Co ()/Au deposited on Si and SiO 2 by polar magneto-optical Kerr effect magnetometry (PMOKE). Topologies of Si and SiO 2 were studied by atomic force microscopy (AFM). We showed that the oxidation of Si induced a change in the evolution of the coercive field and that of the first order of the anisotropy constant according to the thickness of cobalt.