The Surface Texturing of Monocrystalline Silicon with NH4OH and Ion Implantation for Applications in Solar Cells Compatible with CMOS Technology

Silva, A.R.; Miyoshi, Juliana Harumi; Diniz, J. A.; Dói, I.; Godoy, Juliana Aparecida Preto de

doi:10.1016/j.egypro.2013.12.019

Cited by 14 publications

(12 citation statements)

References 6 publications

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“…The worse the quality of the front contact, the greater the decrease in the cell parameters [46]. Silva et al [54] indicated that the device fabrication processes is important for the solar cell efficiency. For example, the silicon surface texturing process can reduce the optical reflection by increasing the surface absorption area of the incident radiation on the cell and finally increase the cell efficiency.…”

Section: Cell Structurementioning

confidence: 99%

Effect of non-uniform illumination and temperature distribution on concentrating solar cell - A review

Xuan

Pei

et al. 2018

Energy

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Concentrated photovoltaic (CPV) technology as a typical PV application is becoming popular due to its advantages of high conversion efficiency and low cost etc.However an important issue for CPV technology is the non-uniformity on the illumination and the temperature which can finally influence the overall electrical efficiency of solar cells. This study presents the feature of the non-uniform illumination and temperature, and reviews the cause and harm of the non-uniform illumination and temperature. Then the specific effect on cell parameters of different solar cells is analyzed, and finally the improving methods for reducing this negative effect on concentrating solar cells are proposed. This review will help researchers to learn the effect of the non-uniformity on the illumination and the temperature, and common improvement method, which will benefit CPV design and optimization. *Revised Manuscript with No Changes Marked Click here to view linked References

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Section: Cell Structurementioning

confidence: 99%

Effect of non-uniform illumination and temperature distribution on concentrating solar cell - A review

Xuan

Pei

et al. 2018

Energy

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“…These structures have the advantage of decreasing the reflectance, resulting in improved light trapping and a subsequent higher photo conversion current in the solar cells. Several chemical baths can be used to generate these microstructures, such as Na2CO3/NaHCO3 solutions [7][8], hydroxide (NaOH), isopropyl alcohol (IPA) [9], NH4OH [10], and NaOCl [11]. The alkaline solutions operate anisotropically on crystalline silicon due to the difference in etching rates between the (100) and (111) planes.…”

Section: Introductionmentioning

confidence: 99%

Investigation of monocrystalline silicon surface texturization by image processing program

et al. 2022

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One of the main issues in the photovoltaic industry of silicon solar cells is the optical losses via reflection. To overcome this issue, texturization (chemical etching) remains the most commonly used method to produce a random pyramid structure to reduce reflection and thus increase photocurrent generation. Because of the anisotropic etching property of alkaline solution, square-based upright pyramids are formed, i.e., the difference in etching rates between (100) and (111) planes. In this paper, the following etching solutions were studied: 4/10, 6/6, and 10/4 (KOH weight percentage/IPA volume percentage).The optical, morphological, and electric characterizations using UV-Vis spectroscopy, electron scanning microscopy (SEM), and quasi-steady-state photoconductance (QSSPC) device are performed. Also, the standard weighted reflectance (SWR) was calculated. The pyramid size distribution generated using KOH-IPA solutions was investigated using an image processing program (ImageJ) via SEM images. The calculation of the height of the pyramids reveals that the typical pyramid size ranges from 3 to 9 m, with large pyramids of small proportions. Furthermore, when the pyramids are distributed in a mixture of tiny and medium pyramids in precise proportions, the reflectivity is at its lowest, and as the number of large pyramids rises, the reflectivity increases.

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“…Texturing of silicon (Si) surfaces is important for several device fabrication processes which are advantageous for high speed capacitors, MOSFETs, high efficiency solar cells [1,2,3], CMOS [4], MEMS devices [5], optical switches [6], nanoprobes, laser cavities, etc. [7,8,9,10,11].…”

Section: Introductionmentioning

confidence: 99%

“…Texturing of silicon (Si) surfaces is important for several device fabrication processes, which are advantageous for high speed capacitors, MOSFETs, high efficiency solar cells [1][2][3], CMOS [4], MEMS devices [5], optical switches [6], nanoprobes, laser cavities, etc [7][8][9][10][11]. Anisotropic etching is a preferred texturing method owing to the presence of minimum defect densities and surface defects [12,13] on the textured surface by changing the local etch rate [14,15].…”

Section: Introductionmentioning

confidence: 99%

Collective evolution of submicron hillocks during the early stages of anisotropic alkaline wet chemical etching of Si(1 0 0) surfaces

Sana

Vázquez

Cuerno

et al. 2017

J. Phys. D: Appl. Phys.

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We address experimentally the large-scale dynamics of Si (100) surfaces during the initial stages of anisotropic wet (KOH) chemical etching, which are characterized through atomic force microscopy. These systems are known to lead to the formation of characteristic pyramids, or hillocks, of typical sizes in the nanometric/micrometer scales, thus with potential for the large number of applications that can benefit from nanotexturing of Si surfaces. The present pattern formation process is very strongly disordered in space. We assess the space correlations in such type of rough surfaces and elucidate the existence of a complex and rich morphological evolution, featuring at least three different regimes in just 10 minutes of etching. Such a complex time behavior cannot be consistently explained within a single formalism for dynamic scaling. The pyramidal structure reveals itself as the basic morphological motif of the surface throughout the dynamics. A detailed analysis of the surface slope distribution with etching time reveals that the texturing process induced by the KOH etching is rather gradual and progressive, which accounts for the dynamic complexity. The various stages of the morphological evolution can be accurately reproduced by computer-generated surfaces composed by uncorrelated pyramidal structures. To reach such an agreement, the key parameters are the average pyramid size, which increases with etching time, its distribution, and the surface coverage by the pyramidal structures.

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The Surface Texturing of Monocrystalline Silicon with NH4OH and Ion Implantation for Applications in Solar Cells Compatible with CMOS Technology

Cited by 14 publications

References 6 publications

Effect of non-uniform illumination and temperature distribution on concentrating solar cell - A review

Effect of non-uniform illumination and temperature distribution on concentrating solar cell - A review

Investigation of monocrystalline silicon surface texturization by image processing program

Collective evolution of submicron hillocks during the early stages of anisotropic alkaline wet chemical etching of Si(1 0 0) surfaces

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